Study of Heat Transfer, Flow and Deposition in the Modified Chemical Vapor Deposition Process

改进化学气相沉积过程中的传热、流动和沉积研究

• 批准号: 8713582
• 负责人: Ralph Greif
• 金额: $ 12.47万
• 依托单位: University of California-Berkeley
• 依托单位国家: 美国
• 项目类别: Standard Grant
• 财政年份: 1987
• 资助国家: 美国
• 起止时间: 1987-07-01 至 1990-07-31
• 项目状态: 已结题
• 来源: https://www.nsf.gov/awardsearch/showAward?AWD_ID=8713582&HistoricalAwards=false
• 关键词: Study; Heat; Transfer; Flow; Deposition

The modified chemical vapor deposition (MCVD) process is in wide use for the fabrication of optical fibers. One of the steps of the process is to deposit high purity chemicals on the inner surface of a fused silica tube to form doped silica glass layers. This is accomplished by passing a high purity gas mixture through the bore of a rotating silica tube. The tube is mounted in a glass-working lathe and is heated externally by a moving torch. The reagents are heated by the torch, causing a gas-phase reaction which results in the formation of submicron glassy particles. These particles travel along the tube and are deposited on the wall, downstream of the torch. Although the MCVD process is operational, the theoretical underpinnings are woefully weak. The objective of the proposed research is to provide a strengthened underpinning which should lead to more efficient operation. Features to be investigated include the effects of torch heating, torch speed, gas flow, tube rotation, and thermal radiation.

改进的化学气相沉积（MCVD）工艺是在 广泛用于制造光纤。 之一 该方法的步骤是将高纯度化学品存款在 熔融石英管的内表面以形成掺杂石英玻璃 层次。 这是通过使高纯度气体 混合物通过旋转二氧化硅管的孔。 管 安装在玻璃加工车床上， 移动的手电筒 试剂被火炬加热， 一种气相反应，导致形成 亚微米玻璃状颗粒。 这些粒子沿着 管和沉积在墙上，下游的火炬。 虽然MCVD工艺是可操作的，但理论上 基础薄弱得可怜。 建议的目标 研究是为了提供一个加强的基础， 从而导致更有效操作。 待调查的特征 包括焊炬加热、焊炬速度、气流 管旋转和热辐射。