Fundamental Deposition Processes in Optical Fiber Manufacturing

光纤制造中的基本沉积工艺

• 批准号: 9006416
• 负责人: Ralph Greif
• 金额: $ 13.2万
• 依托单位: University of California-Berkeley
• 依托单位国家: 美国
• 项目类别: Standard Grant
• 财政年份: 1990
• 资助国家: 美国
• 起止时间: 1990-08-15 至 1993-12-31
• 项目状态: 已结题
• 来源: https://www.nsf.gov/awardsearch/showAward?AWD_ID=9006416&HistoricalAwards=false
• 关键词: Fundamental; Deposition; Processes; Optical; Fiber

This project is a collaborative study of flame assisted SiO2 formation and deposition for use in the Outside Vapor Deposition (OVD) process of forming SiO2 boules for producing optical fiber. An attractive new method, called Electrin Field Enhanced Deposition (EFED), to enhance the deposition rate of SiO2 using an electric field is a major topic of study. The scientific goal of the research is to determine scaling laws for designing optimal flame configurations and for understanding the effect of operating parameters on the deposition process. The methodology combines numerical and analytic modeling with experimental measurements. Benefits of the research include an enhanced ability to predict the effect of changing operating parameters and geometry on the deposition rate and efficiency and the potential addition of a valuable new method for enhancing deposition. Although the study focuses on the OVD process, the results should be valuable in obtaining an improved understanding of other silica deposition processes and configurations and other flame deposition processes such as silicon carbide surface hardening and titanium dioxide paint production.

该项目是一项关于火焰辅助二氧化硅形成和沉积的合作研究，用于外部气相沉积(OVD)过程，该过程形成用于生产光纤的二氧化硅小球。电场增强沉积(EFED)是一种利用电场提高SiO_2沉积速率的新方法，是目前研究的主要课题。这项研究的科学目标是确定设计最佳火焰构型的标度律，并了解操作参数对沉积过程的影响。该方法将数值模拟和解析模拟与实验测量相结合。这项研究的好处包括增强了预测改变操作参数和几何形状对沉积速度和效率的影响的能力，以及可能增加一种有价值的新方法来增强沉积。虽然这项研究的重点是OVD工艺，但其结果对于更好地了解其他二氧化硅沉积工艺和配置以及其他火焰沉积工艺，如碳化硅表面硬化和二氧化钛涂料生产，应该是有价值的。