Ion-Beam Enhanced Deposition of High Tc Superconducting ThinFilms

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This proposal deals with a study of the use of beam-enhanced deposition techniques in the growth of high temperature superconducting thin films on a variety of substrates. Argon or oxygen ions from a Kaufman ion source will be directed onto the surface of a YBa2Cu3Ox thin-film during deposition by sputtering, low pressure CVD, and PECVD. Studies of this technique on other thin- film systems have demonstrated the capability of ion-beams to alter the properties of deposited films. This work aims at having a positive impact on the technology of high-temperature superconductor thin-film growth by using ion-beams to significantly alter film qualities, increase the incorporation of oxygen into the growing films, and possibly improve the annealing requirements for these materials.