Incorporation of Plasma Etching Experiments in UndergraduateMicroelectronics Fabrication Laboratory at University of New Mexico

等离子体刻蚀已成为制造现代微电子集成电路的无价工具，使电子元器件的高封装密度成为可能，而高封装密度已成为现代电路的标准。许多学院和大学开设实验室课程，为本科生提供制造微电子元件的“实践”体验。然而，这些课程忽视了等离子刻蚀，而倾向于更容易、但不再适用于工业的湿法化学刻蚀方法，使得即将毕业的工程师在半导体的等离子加工方面知识有限，没有实际经验。该项目包括本科微电子实验室的实验工作，旨在让学生了解基本的等离子体处理设备，教授学生蚀刻半导体材料的技术，并促进学生对基本等离子体工艺和诊断技术的理解。适合在本科实验室使用的诊断工具使学生能够了解等离子体中发生的过程，以及评估材料的等离子体蚀刻结果。使用该设备，学生可以进行一系列实验，了解射频等离子体系统的特性，进行一些简单的诊断研究，并评估各种半导体材料的蚀刻结果。相对较少的资本支出使学生能够深入了解等离子刻蚀及其在半导体行业中的实施。

Plasma etching has become an invaluable tool in the fabrication of modern microelectronic integrated circuits, making possible the high packing density of electronic components that has become standard in modern circuitry. Many colleges and universities offer laboratory courses designed to give undergraduate students "hands-on" experience with fabricating microelectronic components. However, these courses ignore plasma etching in favor of the easier, but no longer industrially useful, wet-chemical etch methods, leaving the graduating engineer with limited knowledge and no practical experience in plasma processing of semiconductors. This project incorporates experimental work in the undergraduate microelectronics laboratory designed to give students a knowledge of basic plasma processing equipment, to teach students techniques for etching semiconductor materials, and to facilitate the students' understanding of fundamental plasma processes and diagnostic techniques. Diagnostic tools suitable for use in an undergraduate laboratory allow the student to understand the processes taking place in the plasma, as well as to evaluate the results of plasma etching of materials. Using this equipment, students perform a series of experiments learning the characteristics of rf plasma systems, perform some easy diagnostic studies, and evaluate the results of etching of various semiconductor materials. A relatively modest capital expenditure provides the student with an in-depth knowledge of plasma etching, and its implementation in the semiconductor industry.