Matrix Isolation Studies of Reactive Intermediates: Formation by Excimer Laser Irradiation and/or Twin Jet Deposition

教授布鲁斯奥尔特是由赠款的支持， 物理化学计划，以调查中间体 被困在固体基质中的化学反应 氩气其中一些研究可能会进一步加深我们对 化学气相沉积工艺用于制造 半导体器件. 奥尔特将利用矩阵的独特功能 分离以研究几类活性中间体。 很大一部分工作将用于 准分子激光多光子电离技术的发展 产生反应性中间体的光化学方法， 包括自由基片段、新的重排产物， 离子。 两类重要的分子复合物也将 在形成后通过双喷射沉积进行表征。 第一类由冠醚和冠醚之间的络合物组成。 某些阳离子和中性酸。 第二类由 III族和V族元素的中间络合物， 被认为在化学气相沉积中起主要作用 半导体薄膜。 光谱表征 这些复合物将使我们更好地理解 分子相互作用和中间复合物的作用 在化学过程中。

Professor Bruce Ault is supported by a grant from The Physical Chemistry Program to investigate intermediates of chemical reactions which have been trapped in a matrix of solid Argon. Some of these studies may further our understanding of the chemical vapor deposition process used for making semiconductor devices. Ault will exploit the unique capabilities of matrix isolation to study several classes of reactive intermediates. A significant portion of the effort will be directed toward the development of excimer laser multiphoton ionization as a photochemical means of generating reactive intermediates, including radical fragments, novel rearrangement products, and ions. Two important classes of molecular complexes will also be characterized after formation through twin jet deposition. The first class consists of complexes between crown ethers and certain cations and neutral acids. The second class consists of intermediate complexes of group III and V elements which are thought to play a major role in the chemical vapor deposition of semiconductor films. Spectroscopic characterization of these complexes will lead to a better understanding of molecular interactions and the role of intermediate complexes in chemical processes.