Matrix Isolation Studies of Reactive Intermediates: Formation by Excimer Laser Irradiation and/or Twin Jet Deposition

Bruce Ault教授由物理化学计划资助，研究化学反应的中间体，这些中间体被困在固体氩气基质中。其中一些研究可能会进一步加深我们对用于制造半导体器件的化学气相沉积工艺的理解。奥尔特将利用基质分离的独特能力来研究几种反应性中间体。大部分的工作将集中在准分子激光多光子电离的发展上，作为一种产生反应中间体的光化学手段，包括自由基碎片、新型重排产物和离子。两类重要的分子复合物也将通过双射流沉积形成后进行表征。第一类是冠醚与某些阳离子和中性酸之间的配合物。第二类由III族和V族元素的中间配合物组成，它们被认为在半导体薄膜的化学气相沉积中起主要作用。这些配合物的光谱表征将导致更好地理解分子相互作用和中间配合物在化学过程中的作用。

Professor Bruce Ault is supported by a grant from The Physical Chemistry Program to investigate intermediates of chemical reactions which have been trapped in a matrix of solid Argon. Some of these studies may further our understanding of the chemical vapor deposition process used for making semiconductor devices. Ault will exploit the unique capabilities of matrix isolation to study several classes of reactive intermediates. A significant portion of the effort will be directed toward the development of excimer laser multiphoton ionization as a photochemical means of generating reactive intermediates, including radical fragments, novel rearrangement products, and ions. Two important classes of molecular complexes will also be characterized after formation through twin jet deposition. The first class consists of complexes between crown ethers and certain cations and neutral acids. The second class consists of intermediate complexes of group III and V elements which are thought to play a major role in the chemical vapor deposition of semiconductor films. Spectroscopic characterization of these complexes will lead to a better understanding of molecular interactions and the role of intermediate complexes in chemical processes.