Matrix Isolation, Cryogenic Thin Film and Liquified Rare Gas Solution Studies of Chemical Intermediates Relevant to Chemical Vapor Deposition

在化学部门实验物理化学项目的这个项目中，辛辛那提大学的Bruce Ault将使用基质分离光谱来研究化学气相沉积（CVD）过程中形成的中间体。通过这些研究，Ault希望确定CVD机制的初始步骤，以及气相与表面介导反应的作用。在此过程中，他将描述在这些实验中分离出来的不寻常物种的结构和键合。奥尔特将使用量子力学计算来帮助识别和表征新的中间体。化学气相沉积用于生产各种各样的绝缘、半导体、导电和超导薄膜，具有重要的社会和商业意义。在这个项目中，将使用分散在稀有气体固体、薄膜或溶液中的材料进行极低温实验，以分离和保存CVD加工中涉及的化学反应的中间产物。了解这些产品和CVD机理可以提高薄膜制造中最终产品的效率和质量。

In this project in the Experimental Physical Chemistry Program of the Chemistry Division, Bruce Ault of the University of Cincinnati will use matrix isolation spectroscopy to study intermediates formed during Chemical Vapor Deposition (CVD) processes. Through these studies Ault hopes to identify the initial steps in the mechanism of CVD as well as the role of gas-phase versus surface-mediated reactions. Along the way he will characterize the structure and bonding of unusual species isolated during these experiments. Ault will use quantum-mechanical calculations to help identify and characterize new intermediates. %%% Chemical Vapor Deposition is used to produce a wide range of insulating, semiconducting, conducting, and superconducting thin films having great societal and commercial importance. In this project, very low temperature experiments using materials dispersed through rare-gas solids, thin films, or solutions will be conducted to isolate and preserve the intermediate products of the chemical reactions involved in CVD processing. Knowledge of these products and of the mechanisms of CVD can allow improvement in both the efficiency and the quality of the final products in thin film manufacturing.