Matrix Isolation, Cryogenic Thin Film and Liquified Rare Gas Solution Studies of Chemical Intermediates Relevant to Chemical Vapor Deposition

化学气相沉积相关化学中间体的基体隔离、低温薄膜和液化稀有气体溶液研究

• 批准号: 9322622
• 负责人: Bruce Ault
• 金额: --
• 依托单位: University of Cincinnati Main Campus
• 依托单位国家: 美国
• 项目类别: Continuing grant
• 财政年份: 1994
• 资助国家: 美国
• 起止时间: 1994-05-01 至 1998-04-30
• 项目状态: 已结题
• 来源: https://www.nsf.gov/awardsearch/showAward?AWD_ID=9322622&HistoricalAwards=false
• 关键词: Matrix; Isolation; Cryogenic; Thin; Film

In this project in the Experimental Physical Chemistry Program of the Chemistry Division, Bruce Ault of the University of Cincinnati will use matrix isolation spectroscopy to study intermediates formed during Chemical Vapor Deposition (CVD) processes. Through these studies Ault hopes to identify the initial steps in the mechanism of CVD as well as the role of gas-phase versus surface-mediated reactions. Along the way he will characterize the structure and bonding of unusual species isolated during these experiments. Ault will use quantum-mechanical calculations to help identify and characterize new intermediates. %%% Chemical Vapor Deposition is used to produce a wide range of insulating, semiconducting, conducting, and superconducting thin films having great societal and commercial importance. In this project, very low temperature experiments using materials dispersed through rare-gas solids, thin films, or solutions will be conducted to isolate and preserve the intermediate products of the chemical reactions involved in CVD processing. Knowledge of these products and of the mechanisms of CVD can allow improvement in both the efficiency and the quality of the final products in thin film manufacturing.

在这个项目中，在实验物理化学计划的 辛辛那提大学的布鲁斯奥尔特将使用 基质分离光谱法，以研究 化学气相沉积（CVD）工艺。 通过这些研究，奥尔特 希望能够确定CVD机制的初始步骤， 气相与表面介导反应的作用。 沿着 他将描述不寻常物种的结构和结合 在这些实验中， 奥尔特将利用量子力学 计算以帮助识别和表征新中间体。 %化学气相沉积用于生产各种绝缘材料， 半导体、导电和超导薄膜， 社会和商业重要性。 在这个项目中， 利用通过稀有气体分散的材料的温度实验 固体、薄膜或溶液将被进行分离， 保存化学反应的中间产物， CVD工艺。 了解这些产品和CVD的机制 可以提高最终的效率和质量， 薄膜制造中的产品。