Theoretrical and Experimental Studies of Laser Chemical Vapor Deposition for Selected Area Deposition of Pure Titanium

激光化学气相沉积（LCVD）技术可用于生产具有精确空间控制的薄层材料。虽然这已经被清楚地证明了，但很少有人去理解LCVD过程的基本原理。将从光学、热学和化学等方面对纯钛的沉积机理进行实验研究。研究结果将用于开发沉积过程的通用数学模型。

Laser Chemical Vapor Deposition (LCVD) techniques can be used to produce thin layers of materials with precise spatial control. Although this has been clearly demonstrated, little has been done to understand the fundamentals of the LCVD process. Experimental studies of the deposition mechanism for pure titanium will be conducted using optical, thermal and chemical properties. The results will be used to develop generic mathematical models for the deposition process.