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Metal Surfaces, Interfaces, and Multilayer Structures

Metal Surfaces, Interfaces, and Multilayer Structures
金属表面、界面和多层结构
批准号:
8919056
负责人:
Tai Chiang
金额:
$26.9万
依托单位国家:
美国
项目类别:
Continuing Grant
财政年份:
1990
资助国家:
美国
项目状态:
已结题
起止时间:
1990-02-15 至 1993-07-31

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中文摘要
翻译
金属表面、界面、覆盖层和多层结构的生长行为和特性的实验研究。其目的是了解支配它们的结晶形式、化学成分和电子性质的原理。采用的技术包括在同步加速器源和内部的光电子发射、俄歇能谱、电子衍射、分子束外延以及扫描隧道显微镜和光谱分析。
英文摘要
Experimental investigations on the growth behavior and properties of metal surfaces, interfaces, overlayers, and multilayer structures. The purpose is to understand the principles governing their crystalline form, chemical composition, and electronic properties. Techniques employed include photoemission, at synchrotron sources and in-house, Auger spectroscopy, electron diffraction, molecular beam epitaxy, and scanning tunneling microscopy and spectroscopy.
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会议论文
Coupled Electronic and Lattice Structures in Thin Crystalline Films
Electronic and Atomistic Effects in Nanostructures
Electronic and Atomistic Effects in Nanostructures
Electronic and Atomistic Effects in Quantum Structures
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