Metal Surfaces, Interfaces, and Multilayer Structures

金属表面、界面、复层及多层结构生长行为及性能之实验研究。目的是了解控制它们的晶体形态、化学组成和电子特性的原理。所采用的技术包括光电发射，在同步加速器源和内部，俄歇光谱，电子衍射，分子束外延，扫描隧道显微镜和光谱学。

Experimental investigations on the growth behavior and properties of metal surfaces, interfaces, overlayers, and multilayer structures. The purpose is to understand the principles governing their crystalline form, chemical composition, and electronic properties. Techniques employed include photoemission, at synchrotron sources and in-house, Auger spectroscopy, electron diffraction, molecular beam epitaxy, and scanning tunneling microscopy and spectroscopy.