X-Pinch X-Ray Source for Microlithography (REU SUPPLEMENT)

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The X-pinch x-ray source driven by a pulsed power generator may be capable of exposing a resist on a complete 4 cm by 4 cm wafer in a single submicrosecond pulse. This source consists of a 2 fine aluminum (Al) wires stretched between the output electrodes of the power source so as to touch at a single point in the form of an X. Typically 500 J of 1.6 keV (7.8 A) Al K-shell radiation was obtained from a 0.5 mm region at the point of contact of the two wires when a 4 ns, 500 kA current pulse was passed through them. Experiments will be carried out to determine the resolution and correct exposure conditions for this source on a resist, to minimize the power pulse required for a few hundred Joule yield, to try magnesium and carbon in order to obtain a longer wavelength source, and to improve the pulse-to-pulse reproducibility.