课题基金 / 基金详情

Engineering Research Equipment Grant: Microwave Assisted Chemical Vapor Deposition (CVD) System for Diamond Films/Coatings

Engineering Research Equipment Grant: Microwave Assisted Chemical Vapor Deposition (CVD) System for Diamond Films/Coatings
工程研究设备补助金:用于金刚石薄膜/涂层的微波辅助化学气相沉积 (CVD) 系统
批准号:
9007002
负责人:
Ranga Komanduri
金额:
$7.36万
依托单位:
依托单位国家:
美国
项目类别:
Standard Grant
财政年份:
1990
资助国家:
美国
项目状态:
已结题
起止时间:
1990-05-01 至 1992-04-30

项目摘要

项目成果

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中文摘要
翻译
配套资金将用于购置一套用于研究金刚石薄膜和涂层的化学气相沉积系统。将详细研究基本工艺参数、基材附着力和摩擦学性能之间的关系,以优化摩擦学性能。
英文摘要
Matching funds will support acquisition of a chemical vapor deposition system for study of diamond films and coatings. The relationship between fundamental processing parameters, substrate adherence, and tribological performance will be studied in detail with the goal of optimizing the tribological properties.
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会议论文
Workshop on Sensing and Prognostics for Scalability of Nanomanufacturing
  • 批准号:
    0955249
  • 项目类别:
    Standard Grant
  • 资助金额:
    $0.5万
  • 财政年份:
    2009
  • 负责人:
    Ranga Komanduri
  • 依托单位:
A Novel Approach for the Development of Accurate ab inito Potential Energy Surfaces for Atomistic Simulations of MEMS Applications
  • 批准号:
    0457663
  • 项目类别:
    Standard Grant
  • 资助金额:
    $0.0万
  • 财政年份:
    2005
  • 负责人:
    Ranga Komanduri
  • 依托单位:
US-India Cooperative Research: Magnetic Field Assisted Finishing Process
  • 批准号:
    0217947
  • 项目类别:
    Standard Grant
  • 资助金额:
    $2.37万
  • 财政年份:
    2002
  • 负责人:
    Ranga Komanduri
  • 依托单位:
WORKSHOP: Unsolved Problems and Research Needs in Thermal Analysis of Material Removal Processes; Stillwater, OK, October 23-25, 2002
  • 批准号:
    0236289
  • 项目类别:
    Standard Grant
  • 资助金额:
    $3.38万
  • 财政年份:
    2002
  • 负责人:
    Ranga Komanduri
  • 依托单位:
国内基金
海外基金
Research on Quantum Field Theory without a Lagrangian Description
  • 批准号:
    24ZR1403900
  • 项目类别:
    省市级项目
  • 资助金额:
    --
  • 批准年份:
    2024
  • 负责人:
    SATOSHI NAWATA
  • 依托单位:
Cell Research
Cell Research
Cell Research (细胞研究)