A Compact Electron Injector for an X-Ray Lithography Ring
用于 X 射线光刻环的紧凑型电子注入器
基本信息
- 批准号:9060668
- 负责人:
- 金额:$ 5万
- 依托单位:
- 依托单位国家:美国
- 项目类别:Standard Grant
- 财政年份:1991
- 资助国家:美国
- 起止时间:1991-01-01 至 1991-09-30
- 项目状态:已结题
- 来源:
- 关键词:
项目摘要
We have proposed a method to reduce the size of a compact x-ray lithography machine used for etching the next-generation high-density computer chips. A high gradient electron accelerator powered by a relativistic klystron is used in place of the conventional linac as an injector to a superconducting synchrotron radiation ring to produce intense x-rays. Recent experimental results have demonstrated that electrons can reach the same final energy in a much shorter section of the high gradient accelerator than the conventional linac. The proposed machine is therefore much smaller than the conventional x-ray synchrotron machines. The compact machine enables manufacturers to utilize high-energy, high-intensity x- rays to produce various high-density computer chips in a factory environment. In Phase I of this research, we will perform conceptual studies for the injection system, and will consider the related physics and engineering issues for combining the relativistic klystron high gradient accelerator (RK/HGA) and the superconducting synchrotron radiation ring (SSRR) into a single x-ray production machine. Particular consideration will be given to the compatibility of the extremely short pulses produced by the RK/HGA and the macropulses required by the SSRR, to the preservation of electron beam emittance, and to tradeoff studies of various kicker magnet configurations in order to ensure efficient transfer of the beam from the RK/HGA to the SSRR.
我们提出了一种减小用于刻蚀下一代高密度计算机芯片的紧凑型X射线光刻机尺寸的方法。由相对论速调管驱动的高梯度电子加速器被用来代替传统的直线加速器作为超导同步辐射环的注入器,以产生强X射线。最近的实验结果表明,与传统的直线加速器相比,电子可以在高梯度加速器的更短的部分内达到相同的最终能量。因此,拟议的机器比传统的X射线同步加速器要小得多。这种紧凑型机器使制造商能够在工厂环境中利用高能、高强度的X射线来生产各种高密度计算机芯片。在本研究的第一阶段,我们将对喷射系统进行概念性研究,并将考虑将相对论性速调管高梯度加速器(RK/HGA)和超导同步辐射环(SSRR)合并为一台X射线产生机的相关物理和工程问题。将特别考虑由RK/HGA产生的极短脉冲与SSRR所需的宏脉冲的兼容性,以保持电子束发射度,并对各种Kicker磁铁配置进行权衡研究,以确保将束流从RK/HGA有效地转移到SSRR。
项目成果
期刊论文数量(0)
专著数量(0)
科研奖励数量(0)
会议论文数量(0)
专利数量(0)
数据更新时间:{{ journalArticles.updateTime }}
{{
item.title }}
{{ item.translation_title }}
- DOI:
{{ item.doi }} - 发表时间:
{{ item.publish_year }} - 期刊:
- 影响因子:{{ item.factor }}
- 作者:
{{ item.authors }} - 通讯作者:
{{ item.author }}
数据更新时间:{{ journalArticles.updateTime }}
{{ item.title }}
- 作者:
{{ item.author }}
数据更新时间:{{ monograph.updateTime }}
{{ item.title }}
- 作者:
{{ item.author }}
数据更新时间:{{ sciAawards.updateTime }}
{{ item.title }}
- 作者:
{{ item.author }}
数据更新时间:{{ conferencePapers.updateTime }}
{{ item.title }}
- 作者:
{{ item.author }}
数据更新时间:{{ patent.updateTime }}
David U. Yu其他文献
David U. Yu的其他文献
{{
item.title }}
{{ item.translation_title }}
- DOI:
{{ item.doi }} - 发表时间:
{{ item.publish_year }} - 期刊:
- 影响因子:{{ item.factor }}
- 作者:
{{ item.authors }} - 通讯作者:
{{ item.author }}
{{ truncateString('David U. Yu', 18)}}的其他基金
SBIR Phase I: Microfabrication of Planar Accelerating Structures for High-Frequency Electron Linear Accelerators
SBIR 第一阶段:高频电子线性加速器平面加速结构的微加工
- 批准号:
9661539 - 财政年份:1997
- 资助金额:
$ 5万 - 项目类别:
Standard Grant
SBIR PHASE II: A High-Energy Electron Injector for X-ray Chip Lithography and Microfabrication
SBIR PHASE II:用于 X 射线芯片光刻和微加工的高能电子注入器
- 批准号:
9529825 - 财政年份:1996
- 资助金额:
$ 5万 - 项目类别:
Standard Grant
A High-Gradient Electron Injector for X-Ray Chip Lithography and Microfabrication
用于 X 射线芯片光刻和微加工的高梯度电子注入器
- 批准号:
9461156 - 财政年份:1995
- 资助金额:
$ 5万 - 项目类别:
Standard Grant
相似国自然基金
Muon--electron转换过程的实验研究
- 批准号:11335009
- 批准年份:2013
- 资助金额:360.0 万元
- 项目类别:重点项目
相似海外基金
Field emission scanning electron microscope
场发射扫描电子显微镜
- 批准号:
532701230 - 财政年份:2024
- 资助金额:
$ 5万 - 项目类别:
Major Research Instrumentation
Scanning Transmission Electron Microscope for Beam-Sensitive Materials
用于光束敏感材料的扫描透射电子显微镜
- 批准号:
LE240100063 - 财政年份:2024
- 资助金额:
$ 5万 - 项目类别:
Linkage Infrastructure, Equipment and Facilities
Astroparticle Physics with a Trapped Electron
俘获电子的天体粒子物理学
- 批准号:
EP/Y036263/1 - 财政年份:2024
- 资助金额:
$ 5万 - 项目类别:
Research Grant
RII Track-4:NSF: Resistively-Detected Electron Spin Resonance in Multilayer Graphene
RII Track-4:NSF:多层石墨烯中电阻检测的电子自旋共振
- 批准号:
2327206 - 财政年份:2024
- 资助金额:
$ 5万 - 项目类别:
Standard Grant
Contorted and Strained Molecular Nanographenes: Multi-Electron Storage and Reduction-Induced Transformations
扭曲和应变的分子纳米石墨烯:多电子存储和还原诱导的转变
- 批准号:
2404031 - 财政年份:2024
- 资助金额:
$ 5万 - 项目类别:
Continuing Grant
CAREER: Photo-induced Ultrafast Electron-nuclear Dynamics in Molecules
职业:分子中光致超快电子核动力学
- 批准号:
2340570 - 财政年份:2024
- 资助金额:
$ 5万 - 项目类别:
Continuing Grant
Intelligent cryo-electron microscopy of G protein-coupled receptors
G 蛋白偶联受体的智能冷冻电子显微镜
- 批准号:
23K23818 - 财政年份:2024
- 资助金额:
$ 5万 - 项目类别:
Grant-in-Aid for Scientific Research (B)
CAS: Proton-Coupled Electron Transfer Reactions from Ligand-to-Metal Charge Transfer Excited States.
CAS:配体到金属电荷转移激发态的质子耦合电子转移反应。
- 批准号:
2400727 - 财政年份:2024
- 资助金额:
$ 5万 - 项目类别:
Standard Grant
CAS: Highly Interacting Panchromatic Push-Pull Systems: Symmetry Breaking and Quantum Coherence in Electron Transfer
CAS:高度交互的全色推拉系统:电子转移中的对称破缺和量子相干性
- 批准号:
2345836 - 财政年份:2024
- 资助金额:
$ 5万 - 项目类别:
Standard Grant
CAREER: Connecting eukaryotic electron transfer components to nitrogenase using a bacterial chassis
职业:使用细菌底盘将真核电子传递组件连接到固氮酶
- 批准号:
2338085 - 财政年份:2024
- 资助金额:
$ 5万 - 项目类别:
Continuing Grant