REG: A High Temperature X-Ray Diffraction Facility

REG：高温 X 射线衍射设备

• 批准号: 9112088
• 负责人: Subra Suresh
• 金额: $ 13.5万
• 依托单位: Brown University
• 依托单位国家: 美国
• 项目类别: Standard Grant
• 财政年份: 1991
• 资助国家: 美国
• 起止时间: 1991-08-15 至 1993-07-31
• 项目状态: 已结题
• 来源: https://www.nsf.gov/awardsearch/showAward?AWD_ID=9112088&HistoricalAwards=false
• 关键词: REG; Temperature; Ray; Diffraction; Facility

Modern X-ray diffraction (XRD) equipment is requested. The capabilities of the new equipment will include a powder diffractometer with a heating stage, glancing angle incidence optics for thin film and multilayer characterization, and a dedicated double-crystal X-ray diffractometer for defect characterization of strained-layer epitaxial thin films. A study on thermal oxidation of ceramic and intermetallic matrix composites by in situ heating in an X-ray diffractometer and correlation with mechanical behavior is anticipated. Another research program that will benefit strongly from the new instrument, is analytical characterization of ceramic composites synthesized by the novel Chemical Vapor Infiltration (CVI) technique. Similarly, XRD work will be applied to chemically vapor deposited ceramic thin films for protective coating applications, as well as investigating in situ environmental reactions and microstructural changes as a function of temperature. For semiconductor thin films and multilayers, determination of phase stability and alloy formation by high temperature X-ray diffractometer is important for optimization of sequential processing steps that won't compromise device performance.

需要现代 X 射线衍射 (XRD) 设备。 新设备的功能包括带加热台的粉末衍射仪、用于薄膜和多层表征的掠射角入射光学器件，以及用于应变层外延薄膜缺陷表征的专用双晶 X 射线衍射仪。 预计通过在 X 射线衍射仪中原位加热对陶瓷和金属间复合材料的热氧化及其与机械行为的相关性进行研究。 另一个将从新仪器中受益匪浅的研究项目是通过新型化学气相渗透（CVI）技术合成的陶瓷复合材料的分析表征。 同样，X 射线衍射工作将应用于保护涂层应用的化学气相沉积陶瓷薄膜，以及研究原位环境反应和微观结构随温度变化的变化。 对于半导体薄膜和多层膜，通过高温 X 射线衍射仪确定相稳定性和合金形成对于优化连续加工步骤非常重要，而不会影响器件性能。