Atomistic Processes
Atomistic Processes
批准号:
9116362
负责人:
John Spence
金额:
$24.5万
依托单位:
依托单位国家:
美国
项目类别:
Continuing Grant
财政年份:
1992
资助国家:
美国
项目状态:
已结题
起止时间:
1992-08-01 至 1996-01-31
中文摘要
点击翻译按钮获取中文摘要
英文摘要
Fundamental research directed toward improved understanding of atomistic processes and structure in semiconductors and their surfaces will be conducted. The atomistics of dislocation motion in semiconductors will be studied using real-time atomic resolution transmission electron microscope video recordings of dislocation kink motion. The research aims to understand the correlation between kink motions on different moving partial dislocations, the nature of obstacles to kink motion, and their density and waiting times. Also, the early stages of the growth of SiGe alloys on silicon will be studied by ultrahigh vacuum transmission electron diffraction. The research seeks to determine the atomic coordinates for low coverage Ge on Si(111) surface structures, and in comparing the results with scanning tunneling microscope(STM) work. %%% This research is expected to provide deeper fundamental understanding of atomic interactions and their relationship to defects, defect motion, and early stages of epitaxial crystal growth. From an application point of view, understanding these properties is helpful to semiconductor device design and fabrication. The results will be of importance in a general way to the technology of large scale, high speed integrated electronic circuits.
期刊论文(0)
专著(0)
科研奖励(0)
会议论文
MRI: Acquisition of Cryo-EM for Southwest Regional Center
-
批准号:1531991
-
项目类别:Standard Grant
-
资助金额:$282.55万
-
财政年份:2015
-
负责人:John Spence
-
依托单位:
BioFEL Workshop at Lawrence Berekeley Laboratory on January 18-21, 2011.
-
批准号:1101357
-
项目类别:Standard Grant
-
资助金额:$0.5万
-
财政年份:2011
-
负责人:John Spence
-
依托单位:
Dynamics of Electron Transfer-PSI/Ferredoxin
-
批准号:1021557
-
项目类别:Standard Grant
-
资助金额:$59.02万
-
财政年份:2010
-
负责人:John Spence
-
依托单位:
Protein Beam Diffraction
-
批准号:0555845
-
项目类别:Continuing Grant
-
资助金额:$77.01万
-
财政年份:2006
-
负责人:John Spence
-
依托单位:
SGER: Serial Crystallography
-
批准号:0429814
-
项目类别:Standard Grant
-
资助金额:$20.0万
-
财政年份:2004
-
负责人:John Spence
-
依托单位:
Ordering/Lithography in Glasses/Alloys
-
批准号:0245702
-
项目类别:Continuing Grant
-
资助金额:$33.25万
-
财政年份:2003
-
负责人:John Spence
-
依托单位:
Charge States in Ceramics
-
批准号:9973894
-
项目类别:Continuing Grant
-
资助金额:$33.98万
-
财政年份:1999
-
负责人:John Spence
-
依托单位:
Kinks and Surface Potentials
-
批准号:9814055
-
项目类别:Continuing Grant
-
资助金额:$29.95万
-
财政年份:1998
-
负责人:John Spence
-
依托单位:
Acquisition of Image Plate Reader and Development of Scanning Atom Probe
-
批准号:9625553
-
项目类别:Standard Grant
-
资助金额:$4.0万
-
财政年份:1996
-
负责人:John Spence
-
依托单位:
Atomistics of Kinks and Surfactants
-
批准号:9526100
-
项目类别:Continuing Grant
-
资助金额:$28.5万
-
财政年份:1995
-
负责人:John Spence
-
依托单位:
Bulk and Interface Bonding in Ceramics and Intermetallics
-
批准号:9412146
-
项目类别:Continuing Grant
-
资助金额:$27.6万
-
财政年份:1995
-
负责人:John Spence
-
依托单位:
Development of New Point Sources for IONS and Electrons
-
批准号:9112550
-
项目类别:Standard Grant
-
资助金额:$14.93万
-
财政年份:1991
-
负责人:John Spence
-
依托单位:
Electron Crystallography
-
批准号:9015867
-
项目类别:Continuing Grant
-
资助金额:$20.0万
-
财政年份:1991
-
负责人:John Spence
-
依托单位:
Electron Microscopy in Surface Science
-
批准号:8813879
-
项目类别:Continuing Grant
-
资助金额:$32.42万
-
财政年份:1988
-
负责人:John Spence
-
依托单位:
Ultra High Vacuum Electron Microscopy of Surfaces and their Defects (Materials Research)
-
批准号:8512784
-
项目类别:Continuing Grant
-
资助金额:$31.52万
-
财政年份:1985
-
负责人:John Spence
-
依托单位:
Atomic Structure of Line and Planar Defects in Semiconductors (Materials Research)
-
批准号:8002108
-
项目类别:Continuing Grant
-
资助金额:$28.61万
-
财政年份:1980
-
负责人:John Spence
-
依托单位:
Quantitative Analysis of Dislocation Core Structure By High Resolution Electron Imaging and Microdiffraction
-
批准号:7722853
-
项目类别:Standard Grant
-
资助金额:$8.01万
-
财政年份:1978
-
负责人:John Spence
-
依托单位:
国内基金
海外基金
Submesoscale Processes Associated with Oceanic Eddies
-
批准号:--
-
项目类别:--
-
资助金额:160万元
-
批准年份:2022
-
负责人:董昌明
-
依托单位: