Materials Research Group on Studies of Fundamental Mechanisms of Film Growth Using Chemical Vapor Deposition
Materials Research Group on Studies of Fundamental Mechanisms of Film Growth Using Chemical Vapor Deposition
批准号:
9121074
负责人:
Max Lagally
金额:
$279.6万
依托单位国家:
美国
项目类别:
Continuing Grant
财政年份:
1992
资助国家:
美国
项目状态:
已结题
起止时间:
1992-09-01 至 1997-08-31
中文摘要
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英文摘要
This award is to establish a new Materials Research Group at the University of Wisconsin at Madison. The topic of the research of this group is studies the fundamental mechanisms in growth and the resulting microstructure of thin films of semiconducting materials using chemical vapor deposition. The emphases of the research include: understanding of the interaction of the gas phase with the growing thin film through studies of the precursor gases and the gas phase chemistry, quantitative microscopic characterization of the kinetic and thermodynamic mechanisms involved in growth, ex- situ characterization of the structural, optical, and electronic nature of the resulting films, theoretical analysis and computational modeling of the gas phase chemistry and film structure, feedback from characterization and theory to growth chemistry, design of novel processing and materials on the basis of new understanding of the growth process. The group is developing a chemical vapor deposition system capable of growing electronic device-quality films, that also allows in-situ monitoring of the growth process. The initial materials being studied are silicon and silicon-germanium systems/multilayers. The later stages of the research involves studies of group III nitrides, which are wide band-gap semiconductors that show great promise for application in integrated electronic, optical, and optoelectronic devices. Characterization techniques being used include: photoreflectance, photoluminescence, reflection difference spectroscopy, mass spectroscopy, reflection high energy electron diffraction, scanning tunnelling microscopy, and low energy electron diffraction. Theoretical techniques include Monte Carlo simulations, rate equation calculations, and statistical mechanical methods. The strengths of the group are the balance of the complementary expertise of the investigators and the facilities available for this research. This research would not be possible without the collaboration of the investigators working in an interactive and integrated mode.
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批准号:1308532
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项目类别:Standard Grant
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资助金额:$19.77万
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财政年份:2013
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负责人:Max Lagally
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依托单位:
Collaborative Research: Quantum-Cascade-Laser Active Materials Based on Silicon-Germanium Nanomembranes
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批准号:0906930
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项目类别:Continuing Grant
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资助金额:$17.77万
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财政年份:2009
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依托单位:
Development of a Unique Interactive Growth Chamber for Magnetic Nanostructures
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批准号:9704196
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项目类别:Standard Grant
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资助金额:$19.05万
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财政年份:1997
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负责人:Max Lagally
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依托单位:
DNA Computation on Surfaces
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批准号:9613799
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项目类别:Continuing Grant
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资助金额:$90.0万
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财政年份:1996
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负责人:Max Lagally
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依托单位:
Acquisition of a Low-Energy Electron Microscope
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批准号:9413806
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项目类别:Standard Grant
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资助金额:$56.0万
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财政年份:1994
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负责人:Max Lagally
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依托单位:
Crystallographic Disorder in Surfaces and Thin Films
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批准号:9304912
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项目类别:Continuing Grant
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资助金额:$78.0万
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财政年份:1993
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负责人:Max Lagally
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依托单位:
Atomically Controlled Processing and Micromorphological Characterization of Multilayer Thin Films
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批准号:9201856
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项目类别:Continuing Grant
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资助金额:$25.83万
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财政年份:1992
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负责人:Max Lagally
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依托单位:
Crystallographic Disorder in Surfaces and Thin Films
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批准号:8918927
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项目类别:Continuing Grant
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资助金额:$48.6万
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财政年份:1990
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负责人:Max Lagally
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依托单位:
Crystallographic Disorder on Surfaces
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批准号:8615089
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项目类别:Continuing Grant
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资助金额:$41.4万
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财政年份:1987
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负责人:Max Lagally
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依托单位:
Static and Dynamic Phenomena at Surfaces and in Overlayers with Limited Structural Order (Materials Research)
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批准号:8318601
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项目类别:Continuing Grant
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资助金额:$31.0万
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财政年份:1984
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负责人:Max Lagally
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依托单位:
Development of a High-Resolution Electron Diffractometer forSurface Structural Studies (Materials Research)
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批准号:8207225
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项目类别:Continuing Grant
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资助金额:$13.43万
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财政年份:1982
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负责人:Max Lagally
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依托单位:
Crystallographic Determination of Limitations to Order in Surfaces and Overlayers
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批准号:7825754
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项目类别:Continuing Grant
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资助金额:$42.47万
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财政年份:1979
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负责人:Max Lagally
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依托单位:
Crystallograpy and Structural Properties of Chemisorbed Layers on Metal and Alloy Surfaces
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批准号:7624221
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项目类别:Standard Grant
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资助金额:$7.4万
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财政年份:1976
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负责人:Max Lagally
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依托单位:
Crystallography of Chemisorbed Layers Using Low- Energy Electron Diffraction and Related Techniques
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批准号:7203249
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项目类别:Standard Grant
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资助金额:$6.88万
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财政年份:1972
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负责人:Max Lagally
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依托单位:
国内基金
海外基金
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