Chemical Sensors for CVD Processing

用于 CVD 处理的化学传感器

• 批准号: 9202699
• 负责人: Arthur Ellis
• 金额: $ 48.2万
• 依托单位: University of Wisconsin-Madison
• 依托单位国家: 美国
• 项目类别: Continuing Grant
• 财政年份: 1992
• 资助国家: 美国
• 起止时间: 1992-09-01 至 1996-05-31
• 项目状态: 已结题
• 来源: https://www.nsf.gov/awardsearch/showAward?AWD_ID=9202699&HistoricalAwards=false
• 关键词: Chemical; Sensors; CVD; Processing

The photoluminesence of II-VI or III-V semiconductor is used to identify reversible adsorption of molecules on semiconductor surfaces. These interactions are interpreted in terms of the steric and electronic landscape of the semiconductor surface. The studies are extended to the fabrication and development of robust, real-time, in-situ monitors of the gas-phase composition in chemical vapor deposition (CVD) process streams. These sensors are based on photoluminescence, photoconductivity, or ungated field-effect transitor (FET) design, take advantage of the changes in the work function of the semiconductor on reversible adsorption. Using multisensor arrays, a complement of CVD precursors is monitored simultaneously. Optimization and testing of sensors is done in collaboration with Sandia National Laboratory. Improves quality control in the production by CVD of complex electronic materials is the key to an improved competitive position in these key materials. Achievement of this is hampered by a lack of monitoring devices that give a picture of what is happening in the CVD process. This project attacks this issue directly, aiming at real-time sensors that are suitable for use in automated or manual control systems. This award is part of the Materials Synthesis and Processing Initiative.

利用II-VI或III-V半导体的光致发光 以确定分子在 半导体表面 这些相互作用被解释为 的空间和电子景观的条款， 半导体表面 这些研究扩展到制造和开发 强大的，实时的，现场监测的气相 化学气相沉积（CVD）工艺中的组合物 溪流 这些传感器基于光致发光， 光电导或非门控场效应晶体管 设计，利用工作功能的变化， 半导体的可逆吸附。 使用多传感器 阵列，监测CVD前体的补充 同步 对传感器进行了优化和测试 与桑迪亚国家实验室合作。 提高了CVD法生产复合材料的质量控制 电子材料是提高竞争力的关键 在这些关键材料中。 实现这一点是 由于缺乏监控设备， CVD过程中发生的事情。 该项目攻击 这个问题直接，针对实时传感器， 适用于自动或手动控制系统。 该奖项是材料合成和加工的一部分 倡议