A Pattern-Deviation Scanner for Precise Measurement of Internal Component Locations

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This proposal will investigate the feasibility of measuring to very high resolution (+200 microns) the locations of multiple components of known composition whose positions are intended to conform to a well-defined pattern inside a structure. The proposed technique relies on scanning photon beams across the structure surface, detecting transmitted and scattered radiation in collimated detectors, and employing techniques such as template-matching that incorporate a priori information such as size and composition of the components and their intended pattern. A combined experimental and theoretical investigation is undertaken to study design issues such as source energy, source and detector collimation, scan mode, scan step size and speed, and required number of detectors and their locations for a practical instrument.