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A Kinetics-Based Investigation of the Hall-Petch Effect and Solid Solution Strengthening in Refractory Metal Coatings

A Kinetics-Based Investigation of the Hall-Petch Effect and Solid Solution Strengthening in Refractory Metal Coatings
基于动力学的难熔金属涂层中霍尔-佩蚀效应和固溶强化研究
批准号:
9317479
负责人:
Donald Stone
金额:
$26.5万
依托单位国家:
美国
项目类别:
Continuing Grant
财政年份:
1994
资助国家:
美国
项目状态:
已结题
起止时间:
1994-05-01 至 1998-04-30

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英文摘要
9317479 Stone Strengthening mechanisms in molybdenum and tantalum/nitrogen thin films are explored using unique indentation apparatus. The film compositions are selected as model systems to examine solid solution strengthening and the Hall-Petch effect. Film thicknesses on the order of 2 to 5 microns are deposited on hard substrates. Emphasis is placed on determining the effects of indentation rate and temperature on the hardness, as a function of grain size, alloy content, and structure form. The kinetics of plastic deformation are characterized by load and depth sensing techniques and wafer curvature stress measurements. Results should permit a determination of how well laws governing the kinetics of deformation in bulk materials relate to behavior in thin films. %%% The research will provide an improved understanding of deformation phenomena in hard coatings. This knowledge can lead to new strategies for depositing thin films to achieve improved properties. ***
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