Laser Interferometric Techniques for Temperature Measurement

用于温度测量的激光干涉技术

• 批准号: 9361178
• 负责人: Saleem Zaidi
• 金额: $ 6.47万
• 依托单位: Gratings, Incorporated
• 依托单位国家: 美国
• 项目类别: Standard Grant
• 财政年份: 1994
• 资助国家: 美国
• 起止时间: 1994-01-15 至 1994-12-31
• 项目状态: 已结题
• 来源: https://www.nsf.gov/awardsearch/showAward?AWD_ID=9361178&HistoricalAwards=false
• 关键词: Laser; Interferometric; Techniques; Temperature; Measurement

9361178 Zaidi Laser application for noncontact temperature measurement of a semiconductor wafer is proposed. The technique can be applied for either chemical vapor deposition or rapid thermal processing systems. The method is based on thermal expansion of a semiconductor wafer, and uses speckle patterns generated from the back side (rough surface) of the wafer. Speckle patterns are generated by coherent illumination by two symmetrically incident laser beams. Speckle patterns are recorded at various temperatures and subtracted from an initial frame stored at a known temperature. Speckle decorrelation takes place as number of fringes approaches typical speckle size. Signal-to-noise ratio of the speckle fringes is improved by incorporating single-step phase shift in our data acquisition and processing system. Temperature measurements up to 400-deg are demonstrated with a single reference stored frame. Fast Fourier Transform of speckle fringe patterns is applied for calculation of speckle fringe period of extract temperature information. A detailed investigation of these techniques is proposed for speckle temperature measurements up to 1000-deg. 1. Potential applications in RTP and CVD systems. 2. Improvement in material synthesis using better temperature during fabrication. *** v s t I $ $ ( F / ! ! / 1 Courier Symbol & Arial 5 Courier New ! X X X " h B % B % ( C R:\WW20USER\ABSTRACT.DOT Denise Henry Denise Henry

小行星9361178 提出了激光在半导体晶片非接触测温中的应用。 该技术可应用于化学气相沉积或快速热处理系统。 该方法基于半导体晶片的热膨胀，并且使用从晶片的背面（粗糙表面）产生的散斑图案。 散斑图案是由两束对称入射的激光相干照明产生的。 散斑图案在各种温度下记录，并从存储在已知温度下的初始帧中减去。 当条纹数接近典型散斑尺寸时，散斑去相关发生。 通过在数据采集和处理系统中加入单步相移，提高了散斑条纹的信噪比。 温度测量高达400度证明与一个单一的参考存储帧。 利用散斑条纹图的快速傅里叶变换计算散斑条纹周期，提取温度信息。 这些技术的详细调查提出了斑点温度测量高达1000度。 1. RTP和CVD系统的潜在应用。 2.在制造过程中使用更好的温度来改进材料合成。 *** v S t 我 $ $ ( F / ! ! / 1件 Symbol Arial 5 Courier新！ X X X " H B % B % ( C R:\WW20USER\ABSTRACT.DOT 丹尼斯亨利丹尼斯亨利