SBIR Phase I: Randomly Textured Nanoscale Surfaces for Silicon Solar Cells

SBIR 第一阶段：硅太阳能电池的随机纹理纳米级表面

• 批准号: 9960184
• 负责人: Saleem Zaidi
• 金额: $ 10万
• 依托单位: Gratings, Incorporated
• 依托单位国家: 美国
• 项目类别: Standard Grant
• 财政年份: 2000
• 资助国家: 美国
• 起止时间: 2000-01-01 至 2000-06-30
• 项目状态: 已结题
• 来源: https://www.nsf.gov/awardsearch/showAward?AWD_ID=9960184&HistoricalAwards=false
• 关键词: SBIR; Phase; Randomly; Textured; Nanoscale

This Phase I Small Business Innovation Research project is designed to improve the efficiency of low-cost multi-crystalline Silicon solar cells by enhancing their light absorption and improving their efficiency. Conventional geometrical texturing schemes are not applicable to multi-crystalline Silicon. We propose a maskless random nanoscale texturing technique using reactive ion etching techniques. This technique has been demonstrated to reduce absolute spectral reflection to less than one percent from the 350-1000 nm spectral region over ~ 130 cm2 areas. The nanoscale texture consists of 20-50-nm linewidth features, and enhanced absorption is based on a physical optics mechanism. The proposed research is aimed at optimization of nanoscale texture and surface passivation for optimized solar cell performance. Solar cells from these surfaces are expected to improve multi-crystalline Silicon efficiency. Potential applications also include Light Emitting Devices and field emission devices.

该第一阶段小型企业创新研究项目旨在通过增强低成本多晶硅太阳能电池的光吸收和提高效率来提高其效率。传统的几何纹理方案不适用于多晶硅。我们提出了一种使用反应离子蚀刻技术的无掩模随机纳米级纹理技术。该技术已被证明可以将约 130 cm2 区域内 350-1000 nm 光谱区域的绝对光谱反射降低至不到 1%。纳米级纹理由 20-50 nm 线宽特征组成，增强吸收基于物理光学机制。所提出的研究旨在优化纳米级纹理和表面钝化，以优化太阳能电池的性能。这些表面的太阳能电池有望提高多晶硅的效率。潜在的应用还包括发光器件和场发射器件。