SBIR Phase I: Randomly Textured Nanoscale Surfaces for Silicon Solar Cells

该第一阶段小企业创新研究项目旨在通过增强光吸收和提高效率来提高低成本多晶硅太阳能电池的效率。传统的几何纹理化方案不适用于多晶硅。我们提出了一种无掩模随机纳米级纹理技术，使用反应离子刻蚀技术。该技术已被证明可在约130 cm 2面积上将350-1000 nm光谱区域的绝对光谱反射降低至小于1%。纳米级纹理由20-50-nm线宽特征组成，并且增强的吸收基于物理光学机制。拟议的研究旨在优化纳米级纹理和表面钝化，以优化太阳能电池的性能。来自这些表面的太阳能电池有望提高多晶硅效率。潜在的应用还包括发光器件和场发射器件。

This Phase I Small Business Innovation Research project is designed to improve the efficiency of low-cost multi-crystalline Silicon solar cells by enhancing their light absorption and improving their efficiency. Conventional geometrical texturing schemes are not applicable to multi-crystalline Silicon. We propose a maskless random nanoscale texturing technique using reactive ion etching techniques. This technique has been demonstrated to reduce absolute spectral reflection to less than one percent from the 350-1000 nm spectral region over ~ 130 cm2 areas. The nanoscale texture consists of 20-50-nm linewidth features, and enhanced absorption is based on a physical optics mechanism. The proposed research is aimed at optimization of nanoscale texture and surface passivation for optimized solar cell performance. Solar cells from these surfaces are expected to improve multi-crystalline Silicon efficiency. Potential applications also include Light Emitting Devices and field emission devices.