SBIR Phase II: Randomly Textured Nanoscale Surfaces for Silicon Solar Cells

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This Small Business Innovation Research (SBIR) Phase II project will integrate random, reactive ion etching (RIE) texturing techniques into low-cost, multi-crystalline (mc) silicon (Si) solar cells. RIE texturing techniques, developed in Phase I, are distinguished by their low-reflection (1 percent), large area (200 square centimeters) application, and the ability to control etched profiles. This texture control has been employed to increase near infrared absorption in Si by enhanced oblique optical coupling into the substrate. RIE-texturing techniques have potential application in several fields including low-cost substrates for surface enhanced Raman scattering and field emission devices. Phase II will be concerned with conformal emitter formation techniques uniquely suited to RIE-textured surfaces. These methods will lead to solar cell manufacturing in a cluster environment with similar chambers for texturing, emitter formation, and nitride films for surface passivation.Potential industrial applications are expected in high-efficiency, RIE-textured, mc-Si solar cells using processes suitable for their respective manufacturing environments.