Acquisition of an Ultrahigh Vacuum Sputter Deposition System for the Preparation of Nanostructured Metal Films
Acquisition of an Ultrahigh Vacuum Sputter Deposition System for the Preparation of Nanostructured Metal Films
批准号:
9411146
负责人:
Katayun Barmak
金额:
$19.65万
依托单位:
依托单位国家:
美国
项目类别:
Standard Grant
财政年份:
1994
资助国家:
美国
项目状态:
已结题
起止时间:
1994-07-15 至 1996-12-31
中文摘要
提供资金用于购置最先进的超真空溅射沉积系统,以制备纳米结构金属薄膜。该系统配备有两个磁控溅射源、两个离子束源(一个用于沉积,一个用于同时离子束改性微结构)、用于衬底加热和偏压的能力、两个气体供应(用于溅射的氩气,以及氧气或氮气)、残余气体分析仪、用于厚度测量的两个结晶速率监视器以及计算机过程控制。UHV溅射沉积系统与世界一流的分析电子显微镜设施相结合,将提供一个独特的机会来研究和操纵纳米尺度上金属薄膜的成分和微观结构。利用该系统可以制备不同成分、不同杂质含量和不同微观结构的金属薄膜。控制微观结构、成分和杂质含量在以下正在进行的研究中非常重要:1)研究了多层薄膜中晶粒结构和晶界扩散的作用; 2)研究了铬在钴合金薄膜晶界上的偏聚机理,(如氧)对这种偏析的影响,以及这种偏析在钴合金薄膜存储介质的磁噪声特性中所起的作用(与IBM合作开发磁存储应用),纳米异质薄膜中颗粒间和相间磁交换耦合的基础研究(与布鲁克海文国家实验室和通用汽车&能源应用研发部合作)。溅射沉积系统也将是有用的研究生和本科生在薄膜材料加工的教育。
英文摘要
Funds are provided for the acquisition of a state-of-art ultrahigh vacuum (UHV) sputter deposition system for the preparation of nanostructured metal films. The system is equipped with two magnetron sputtering sources, two ion beam sources (one for deposition and one for simultaneous ion- beam modification of the microstructure), capabilities for substrate heating and biasing, two gas supplies (argon for sputtering, and oxygen or nitrogen), residual gas analyzer, two crystal rate monitors for thickness measurement, and computer process control. The combination of the UHV sputter deposition system with the world-class analytical electron microscopy facilities at the University will provide a unique opportunity to investigate and manipulate the composition and microstructure of metal films on the nanometer scale. With this system, metal films can be fabricated that have different composition and impurity content and different microstructure. The control of microstructure, composition and impurity content is important in on-going research addressing: 1) examination of the role of grain structure and grain boundary diffusion in multilayer thin films, 2) studies of the mechanism of segregation of chromium to grain boundaries of cobalt-alloy films, the effect of impurities (such as oxygen) on this segregation, and the role that this segregation plays in the magnetic noise characteristics of cobalt-alloy thin film storage media (in collaboration with IBM for magnetic storage applications), and 3) fundamental studies of interparticulate and interphase magnetic exchange coupling in nanoheterogeneous thin films (in collaboration with Brookhaven National Laboratory and General Motors R&D for energy applications). The sputter deposition system also will be useful in the education of graduate and undergraduate students in thin film materials processing.
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依托单位:
海外基金