Optically Probing the Chemistry of Thin Film Processes

光学探测薄膜工艺的化学性质

• 批准号: 9411504
• 负责人: Irving Herman
• 金额: $ 32万
• 依托单位: Columbia University
• 依托单位国家: 美国
• 项目类别: Continuing Grant
• 财政年份: 1994
• 资助国家: 美国
• 起止时间: 1994-12-01 至 1998-11-30
• 项目状态: 已结题
• 来源: https://www.nsf.gov/awardsearch/showAward?AWD_ID=9411504&HistoricalAwards=false
• 关键词: Optically; Probing; Chemistry; Thin; Film

9411504 Herman This research is concemed with the development of optical diagnostic techniques for obtaining a detailed view of the chemistry that occurs on and near the surface during thin film processing. These in situ techniques are used to identify the chemical steps in representative materials processes, specifically plasma-assisted chemical etching. The proposed work consist of two related phases. The first is the development and use of laser-induced thermal desorption (LITD) to study the steady-state surface layer that is formed during etching in a high charge density plasma, specifically an ECR (electron cyclotron resonance) plasma. The chemistry of the formation and desorption of this layer, which is often only a monolayer thick, is key to understanding the etching process. Plasma-induced optical emission and laser induced fluorescence (LIF) will be used to examine the desorbed products. Laser-induced thermal desorption and other optical probes will be used to investigate the ECR etching of important prototype alloy materials in real time. The second phase of the proposed investigation is the development of high-spatial resolution optical probes of pattemed thin film processing, such as the etching of films with a pattemed mask on the surface. Understanding the details of the chemistry that occurs on and immediately above the surface of the exposed film and mask, and near the sidewalls of the mask, is complex. The proposed approach is to probe the gas near the surface with LIF and the surface itself wih Raman microprobe spectroscopy, at times simultaneously, both with 1 micron lateral resolution. This will be done in situ and usually in real-time. %%% The processing of materials often depends critically on the chemistry that occurs on and near the surface. This is true for applications in microelectronics and optoelectronics, which includes patterned etching and the atomic layer-controlled growth of heterostructures, monolayers and films, in nanoma nufacturing, and in the manufacture of optical films and protective coatings. However, a fundamental understanding of the chemical steps that occur is often lacking in such materials processing. This occurs, in part, because of the complex nature of the processes which may include the interplay between events on the surface and in the overlying gas phase, and, in part, because of a lack of diagnostics to identify species and to measure their concentrations with sufficient spatial resolution. The linked goals of this proposal are to develop in situ, real time optical diagnostics that are necessary to obtain a detailed view of these chemical processes, and to use them to identify the chemical steps involved in the processes of several key, yet representative, materials processes.

9411504赫尔曼 这项研究是concemed与光学诊断技术的发展，以获得一个详细的看法，发生在表面上和附近的薄膜加工过程中的化学。这些原位技术用于识别代表性材料工艺中的化学步骤，特别是等离子体辅助化学蚀刻。拟议的工作包括两个相关阶段。第一个是激光诱导热脱附（LITD）的开发和使用，以研究在高电荷密度等离子体，特别是ECR（电子回旋共振）等离子体蚀刻过程中形成的稳态表面层。这层通常只有单层厚，其形成和解吸的化学过程是理解蚀刻过程的关键。等离子体诱导的光发射和激光诱导荧光（LIF）将被用来检查解吸的产品。激光诱导热脱附和其他光学探针将用于真实的实时研究重要原型合金材料的ECR蚀刻。拟议的调查的第二阶段是开发高空间分辨率的光学探针的图案化薄膜处理，如蚀刻的膜与图案化的掩模的表面上。理解在暴露的膜和掩模的表面上和紧接其上以及在掩模的侧壁附近发生的化学的细节是复杂的。所提出的方法是用LIF探测表面附近的气体，用拉曼微探针光谱探测表面本身，有时同时进行，两者的横向分辨率均为1微米。这将在现场进行，通常是实时进行。 %材料的加工通常主要取决于表面上和表面附近发生的化学反应。这对于微电子学和光电子学中的应用是真实的，其中包括异质结构、单层和膜的图案化蚀刻和原子层控制的生长，纳米制造以及光学膜和保护涂层的制造。 然而，在这种材料加工中，通常缺乏对发生的化学步骤的基本理解。发生这种情况，部分原因是由于复杂的性质的过程，其中可能包括事件之间的相互作用的表面上，并在上覆的气相，部分原因是因为缺乏诊断，以确定物种和测量其浓度与足够的空间分辨率。该提案的相关目标是开发现场，真实的时间光学诊断，这是必要的，以获得这些化学过程的详细视图，并使用它们来识别几个关键的，但代表性的，材料过程的过程中所涉及的化学步骤。