Adsorption Sites and Nucleation in Materials Deposition on Silicon and Hydrogen-Terminated Silicon Surfaces

本研究的目标是通过红外（IR）振动光谱和扫描隧道显微镜（STM）的结合，在原子和分子水平上了解硅衬底上的薄膜成核。通过将IR与STM相结合，硅表面材料沉积和蚀刻中的许多重要问题将得到明确解决，这些问题对于理解当前微电子工艺和开发未来技术至关重要。最初的重点将是探索方法的局限性，重点是GaAs/Si系统以及硅的氧化。GaAs/Si系统将测试实验方法的局限性，因为这是一个预计红外强度特别弱的系统。硅氧化也将被研究，因为它的技术重要性，因为它代表了一个系统，在低频率下使用cosi2注入的硅样品可以获得高质量和有趣的红外结果。将被研究的系统包括：用水和乙醇氧化Si（100）作为TEOS（四乙氧基硅烷）MOCVD工艺的模型系统。本研究中使用的表征技术提供了表面上特定位点的键合“指纹”，每种技术的指纹对其他技术的解释都有限制，这比单独使用任何一种技术都能得出更明确的结论。由于这些材料在电子和光子应用中的重要性，研究基本化学和物理过程的细节以及了解结构/性质关系的基本特征非常重要。该计划的一个重要特点是培养学生在材料研究的一个基本的和技术上重要的领域。＊＊＊

9424296 Bent The goal of this research is to obtain an atomic and molecular level understanding of film nucleation on silicon substrates through a combination of infrared(IR) vibrational spectroscopy and scanning tunneling microscopy(STM). By combining IR with STM, a number of important issues in materials deposition and etching on silicon surfaces -- issues which are fundamental to understanding current microelectronics processes and to developing future technologies will be addressed definitively. Initially the focus will be on exploring the limits of the approach with emphasis on the GaAs/Si system as well as emphasis on the oxidation of silicon. The GaAs/Si system will test the limitations of the experimental approach since this is a system where the IR intensities are expected to be particularly weak. Silicon oxidation will also be studied both because of its technological importance and because it represents a system where high quality and interesting IR results at low frequencies using CoSi2-implanted silicon samples can be obtained. The systems that will be investigated include: oxidation of Si(100) by water and by ethanol as a model system for the TEOS (tetraethoxysilane) MOCVD process. %%% The characterization techniques used in this research provide site specific "fingerprints" of bonding at surfaces, and the fingerprint from each of these techniques places constraints on the interpretation of the other which permits more definitive conclusions than would be possible from either of the techniques alone. Because of the significance of these materials for electronic and photonic applications, it is important to study the details of elementary chemical and physical processes, and to understand fundamental features of structure/property relationships. An important feature of the program is the training of students in a fundamentally and technologically significant area of materials research. ***