NSF Young Investigator: Surface Chemistry at Semiconductor Interfaces

这个国家科学基金会青年研究员项目是在表面化学的一般领域，特别关注半导体表面的表征。在该奖项的五年任期内，Maboudian教授和她的学生将对氢和碳氢化合物与铟锑表面的相互作用进行基础研究，这将作为砷化镓半导体的有用模型。这种化学反应将使用广泛的表面敏感技术进行探索，如x射线光电子能谱、低能电子衍射、俄歇和高分辨率电子能量损失能谱。在这个研究项目的过程中，也将探索使用自组装单层来提供无反应、无缺陷的半导体表面。这个项目属于化学部的分析和表面化学项目，将对半导体材料的结构产生重要的见解，这在电子工业中非常重要。此外，该奖项将使Maboudian教授在加州大学伯克利分校作为一名研究人员和教育工作者进一步推进她的整体专业发展。

This National Science Foundation Young Investigator project is in the general area of surface chemistry, with a specific focus on the characterization of semiconductor surfaces. During the five-year tenure of this award, Professor Maboudian and her students will carry out fundamental studies on the interaction of hydrogen and hydrocarbons with indium-antimony surfaces, which serve as useful models for gallium arsenide semiconductors. This chemistry will be explored using a wide range of surface sensitive techniques, such as x-ray photoelectron spectroscopy, low energy electron diffraction, Auger, and high resolution electron energy loss spectrometry. The use of self-assembled monolayers to provide unreactive, defect free semiconductor surfaces will also be explored during the course of this research project. This project, in the Analytical and Surface Chemistry Program of the Chemistry Division, should yield important insights into the structure of semiconductor materials that are of great importance in the electronics industry. Additionally, this award will enable Professor Maboudian to further her overall professional development as a researcher and educator at the University of California at Berkeley.