NSF Young Investigator

9458081本项目旨在研究氧化物的基本材料科学现象，以获得对这些材料的原子水平的了解，并探索它们在先进集成微电子、光学和磁性设备中的应用。我们的方法利用了一种与UHV兼容的多功能薄膜沉积系统，该系统将被用于生长外延异质结构。该系统将90o离轴溅射、轴上溅射、激光烧蚀、蒸发和蚀刻结合在一个腔室中，还将允许各种类型的结构的原位沉积和图案化。%氧化物材料具有广泛的性质，可用于超导体、介电材料、铁电材料、铁磁材料和非线性光学元件的广泛应用。许多先进器件对具有这种混合特性的外延多层膜的要求可以通过氧化物薄膜异质结来实现。这项研究将为氧化物多层器件结构的设计提供指导，并将促进对新氧化物材料的研究。这一研究项目的一个重要特点是在材料和工艺研究的基础和技术上具有重要意义的领域对研究生和本科生进行培训。***

9458081 Eom This project is directed both at studying fundamental materials science phenomena of oxides to gain atomic-level understanding of these materials, and at exploring their utilization in advanced integrated microelectronic, optical and magnetic devices. Our approach utilizes a UHV-compatible versatile thin film deposition system which will be used to grow epitaxial heterostructures. This system will combine 90o off-axis sputtering, on-axis sputtering, laser ablation, evaporation, and etching in one chamber, and will also allow in situ deposition and patterning of various types of structures. %%% Oxide materials possess an enormous range of properties and can be utilized for a wide variety of applications involving superconductors, dielectrics, ferroelectrics, ferromagnetics, and nonlinear optics components. The requirement by many advanced devices for epitaxial multilayers with such mixed properties can potentially be achieved with oxide thin film heterostructures. This study will provide a guideline for the design of oxide multilayer device structures and will also stimulate research into new oxide materials. An important feature of this research project is the training of graduate and undergraduate students in a fundamentally and technologically significant area of materials and processing research. ***