Internal Interfaces in Semiconductors
半导体内部接口
基本信息
- 批准号:9522253
- 负责人:
- 金额:$ 30万
- 依托单位:
- 依托单位国家:美国
- 项目类别:Continuing Grant
- 财政年份:1995
- 资助国家:美国
- 起止时间:1995-08-15 至 1999-07-31
- 项目状态:已结题
- 来源:
- 关键词:
项目摘要
9522253 Carter The goals of this research project are to gain new understanding of microscopic details, particularly chemical bonding and defects, at heterostructure interfaces and of dislocations in the lattice of compound semiconductors. The research will emphasize studies of anti-site bonding which is thought to be an intrinsic factor in the core of dislocations and of nearly all grain boundaries in these materials. Correlation between observed and calculated defect structures will be made through computer image simulation. The electrical properties of interfaces will be investigated by high-resolution cathodoluminescence and electron-beam induced current techniques. Additionally, the mechanical behavior of individual interfaces will be studied by controlled deformation experiments. The project will utilize samples specially prepared where interfaces and defects have been introduced in a controlled manner so that improved understanding of the defects can be obtained, and also understanding of the ways new information can be used to both exploit defect behavior or to develop strategies to control, avoid or eliminate the defects. %%% This research project will apply state-of-the-art materials science analysis and computer simulation techniques to obtain basic understanding of defects at critical interfaces in advanced structures of compound semiconductor materials used in lasers and electronic devices. This research will contribute to improve fundamental understanding of interface chemistry and physical properties as well as other defects which limit the applications or lifetime of semiconductor devices. An important feature of the program is the training of graduate and undergraduate students in a fundamentally and technologically significant area. ***
9522253 Carter本研究项目的目标是获得对微观细节的新理解,特别是异质结构界面处的化学键合和缺陷以及化合物半导体晶格中的位错。 这项研究将强调反位键合的研究,反位键合被认为是这些材料中位错核心和几乎所有晶界的内在因素。 通过计算机图像模拟,将观察到的缺陷结构与计算出的缺陷结构相关联。 界面的电性能将通过高分辨率阴极射线发光和电子束感应电流技术进行研究。 此外,将通过受控变形实验研究各个界面的力学行为。 该项目将使用专门制备的样品,其中界面和缺陷以受控方式引入,以便更好地了解缺陷,并了解新信息可用于开发缺陷行为或制定控制、避免或消除缺陷的策略的方式。本研究计划将应用最先进的材料科学分析和计算机模拟技术,以获得对激光器和电子器件中使用的化合物半导体材料的先进结构中关键界面缺陷的基本了解。 这项研究将有助于提高对界面化学和物理特性以及限制半导体器件应用或寿命的其他缺陷的基本理解。 该计划的一个重要特点是在一个基本的和技术上重要的领域培养研究生和本科生。***
项目成果
期刊论文数量(0)
专著数量(0)
科研奖励数量(0)
会议论文数量(0)
专利数量(0)
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C Carter其他文献
Increased chance of death?
死亡几率增加?
- DOI:
10.1038/sj.bdj.4810682 - 发表时间:
2003-11-08 - 期刊:
- 影响因子:2.300
- 作者:
C Carter - 通讯作者:
C Carter
P01.19. Oxytocin Receptor Gene (OXTR) variation is associated with enhanced affective and placebo conditioning to touch-based complementary interventions
- DOI:
10.1186/1472-6882-12-s1-p19 - 发表时间:
2012-06-12 - 期刊:
- 影响因子:3.400
- 作者:
S Jain;K Aschbacher;N Bat;P Mills;W Jonas;J Ives;C Carter;J Connelly - 通讯作者:
J Connelly
C Carter的其他文献
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{{ truncateString('C Carter', 18)}}的其他基金
GOALI: Mechanisms of Lithiation and Delithiation Reactions in Layered Materials Combining Transmission Electron Microscopy and Atomic Scale Modeling
目标:结合透射电子显微镜和原子尺度建模的层状材料中的锂化和脱锂反应机制
- 批准号:
1820565 - 财政年份:2018
- 资助金额:
$ 30万 - 项目类别:
Standard Grant
First International Workshop in Ceramics: Data Storage Technology; NSF; January 22-23, 2004
第一届国际陶瓷研讨会:数据存储技术;
- 批准号:
0417330 - 财政年份:2004
- 资助金额:
$ 30万 - 项目类别:
Standard Grant
US-India Cooperative Research: Developing Non-Lithographic Methods for Nanopatterning
美印合作研究:开发纳米图案化的非光刻方法
- 批准号:
0352776 - 财政年份:2004
- 资助金额:
$ 30万 - 项目类别:
Standard Grant
Acquisition of a High-Resolution Transmission Electron Microscope to Enhance Research and Training in the Nanocharacterization of Materials
购买高分辨率透射电子显微镜以加强材料纳米表征的研究和培训
- 批准号:
0320641 - 财政年份:2003
- 资助金额:
$ 30万 - 项目类别:
Standard Grant
US-Turkey Cooperative Research: Characterization and Processing of Oxide Powders and Compacts
美国-土耳其合作研究:氧化物粉末和压块的表征和加工
- 批准号:
0322622 - 财政年份:2003
- 资助金额:
$ 30万 - 项目类别:
Standard Grant
International Dissertation Enhancement Research in Glosses and Ceramic Oxides
光泽和陶瓷氧化物的国际论文强化研究
- 批准号:
0226020 - 财政年份:2002
- 资助金额:
$ 30万 - 项目类别:
Standard Grant
Phase Transformations in Crystalline Ceramic Oxides
结晶陶瓷氧化物的相变
- 批准号:
9196234 - 财政年份:1991
- 资助金额:
$ 30万 - 项目类别:
Continuing Grant
Phase Transformations in Crystalline Ceramic Oxides
结晶陶瓷氧化物的相变
- 批准号:
8901218 - 财政年份:1990
- 资助金额:
$ 30万 - 项目类别:
Continuing grant
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