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Dislocations in GaN

Dislocations in GaN
GaN 中的位错
批准号:
0102327
负责人:
C Carter
金额:
$36.05万
依托单位国家:
美国
项目类别:
Continuing Grant
财政年份:
2001
资助国家:
美国
项目状态:
已结题
起止时间:
2001-06-01 至 2005-05-31
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中文摘要
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英文摘要
This project aims at greater understanding of dislocations in GaN. The approach involves generation of dislocations with known Burgers vectors and known character, and the study of how these dislocations propagate during thin film growth. Additionally, the project addresses how dislocation propagation is influenced by orientation of the growth surface, particularly during lateral epitaxial overgrowth (LEO). Electrical and optical properties of these dislocations will also be examined. Specially designed grain boundaries will consist of ordered arrays of dislocations which are self-aligning and self-stabilizing. Variation of misorientation angle will be used to give control over dislocation spacing and character of the dislocations while variation of the boundary plane will be used for Burger vector control. Having many aligned dislocations in a single specimen gives the benefit of meaningful statistical analysis. %%% The project addresses basic research issues in a topical area of materials science with high technological relevance. These studies will improve the fundamental understanding of defects in Gallium Nitride, which is a key material to advanced microelectronics and photonics. An important feature of the program is the integration of research and education through the training of students in a fundamentally and technologically significant area, and education outreach activities to promote diversity. ***
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GOALI: Mechanisms of Lithiation and Delithiation Reactions in Layered Materials Combining Transmission Electron Microscopy and Atomic Scale Modeling
  • 批准号:
    1820565
  • 项目类别:
    Standard Grant
  • 资助金额:
    $44.14万
  • 财政年份:
    2018
  • 负责人:
    C Carter
  • 依托单位:
First International Workshop in Ceramics: Data Storage Technology; NSF; January 22-23, 2004
US-India Cooperative Research: Developing Non-Lithographic Methods for Nanopatterning
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国内基金
海外基金
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  • 资助金额:
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  • 负责人:
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  • 依托单位:
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基于金刚石高效散热封装的高功率高压GaN器件研发与产业化
复合抗磨涂层仿生微结构化表面自润滑 金刚石砂轮的制备与其磨削单晶GaN基础 研究
  • 批准号:
  • 项目类别:
    省市级项目
  • 资助金额:
    10.0万元
  • 批准年份:
    2025
  • 负责人:
    戴厚富
  • 依托单位: