Monitoring and Enhancing Molecular Beam Epitaxy Using Low-Energy Ion Scattering

9523553巴内特本研究项目调查的动力学过程和微观结构发生的掠射角低能离子辐照在MBE生长过程中的结果。角度依赖性离子损伤产生的研究被用来开发新的表面改性方法，并使用原位离子散射光谱作为一种非破坏性的分析技术。 这项研究还包括努力修改岛屿生长的表面形态，并探讨了与选择性外延相关的研究思路。 在整个研究过程中，将使用电学、光学和结构表征来评估薄膜。本研究项目的主要目标是通过研究分子束外延过程中的掠射角低能离子辐照，建立对薄膜合成和加工相关的特定现象的更基本的理解，并通过加工方法的修改将这种理解与先进微电子器件的发展联系起来。 此外，该计划的一个重要特点是在一个基本的和技术上重要的领域培养研究生和本科生。 从这个研究项目中获得的知识和理解预计将有助于提高计算，信息处理和电信中使用的先进设备的性能。***

9523553 Barnett This research project investigates the kinetic processes and microstructure which occur as a result of glancing angle low energy ion irradiation during MBE growth. Studies of angle-dependent ion damage generation are used to develop new approaches to surface modification, and the use of in-situ ion scattering spectroscopy as a non-destructive analytic technique. The research also includes efforts to modify surface morphology in island growth, and explores research ideas related to selective epitaxy. Electrical, optical and structural characterization will be used throughout the research to evaluate the films. %%% The primary goal of this research project is to establish greater basic understanding of particular phenomena relevant to thin film synthesis and processing through the study of glancing angle low energy ion irradiation during molecular beam epitaxy, and to relate this understanding to the development of advanced microelectronics devices through modifications in processing methods. Additionally, an important feature of the program is the training of graduate and undergraduate students in a fundamentally and technologically significant area. The knowledge and understanding gained from this research project is expected to contribute generally to improving the performance of advanced devices used in computing, information processing, and telecommunications. ***