Monitoring and Enhancing Molecular Beam Epitaxy Using Low-Energy Ion Scattering

9523553巴奈特这项研究项目研究了分子束外延生长过程中由于掠射角低能离子辐照而产生的动力学过程和微观结构。利用与角度相关的离子损伤产生的研究来开发表面修饰的新方法，并使用原位离子散射光谱作为一种非破坏性分析技术。这项研究还包括在岛屿生长中改变表面形态的努力，并探索了与选择性外延相关的研究思路。在整个研究过程中，将使用电学、光学和结构表征来评估薄膜。%本研究项目的主要目标是通过研究分子束外延过程中的掠射角低能离子辐照，加深对与薄膜合成和加工相关的特殊现象的基本了解，并将这种了解与通过改进加工方法开发先进的微电子设备相联系。此外，该计划的一个重要特点是在一个重要的基础和技术领域对研究生和本科生进行培训。从这项研究项目中获得的知识和理解预计将总体上有助于提高用于计算、信息处理和电信的先进设备的性能。***

9523553 Barnett This research project investigates the kinetic processes and microstructure which occur as a result of glancing angle low energy ion irradiation during MBE growth. Studies of angle-dependent ion damage generation are used to develop new approaches to surface modification, and the use of in-situ ion scattering spectroscopy as a non-destructive analytic technique. The research also includes efforts to modify surface morphology in island growth, and explores research ideas related to selective epitaxy. Electrical, optical and structural characterization will be used throughout the research to evaluate the films. %%% The primary goal of this research project is to establish greater basic understanding of particular phenomena relevant to thin film synthesis and processing through the study of glancing angle low energy ion irradiation during molecular beam epitaxy, and to relate this understanding to the development of advanced microelectronics devices through modifications in processing methods. Additionally, an important feature of the program is the training of graduate and undergraduate students in a fundamentally and technologically significant area. The knowledge and understanding gained from this research project is expected to contribute generally to improving the performance of advanced devices used in computing, information processing, and telecommunications. ***