Study of Growth Front Roughening Using Diffraction and Imaging Techniques

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w:\awards\awards96\*.doc 9531482 Wang This research will support the investigation of the formation of interface roughness during growth/etching of surfaces under conditions far from equilibrium. Interface roughness is a central issue in thin film deposition and directly controls many physical and chemical properties of the films. The goals are to grow amorphous films and test unambiguously the validity of various proposed mechanisms based on noise induced growth front roughening. Differentiation of various roughness mechanisms in a molecular beam epitaxy (MBE) growth front will be carried out as will the development of real time diffraction techniques, especially light scattering for quantitative measurement of rough surface growth in a hostile deposition environment. %%% This research will support the investigation of the formation of interface roughness during growth/etching of surfaces under conditions far from equilibrium. Interface roughness is a central issue in thin film deposition and directly controls many physical and chemical properties of the films. The goals are to grow amorphous films and test unambiguously the validity of various proposed mechanisms based on noise induced growth front roughening. Various growth techniques will be used and a light scattering technique for the in situ monitoring of rough surface growth will be developed. ***