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Development of a "Process Simulator" for Plastic Relaxation in Strained Layer Semiconductor Epitaxy

Development of a "Process Simulator" for Plastic Relaxation in Strained Layer Semiconductor Epitaxy
应变层半导体外延塑性弛豫“工艺模拟器”的开发
批准号:
9531696
负责人:
Robert Hull
金额:
$27.83万
依托单位国家:
美国
项目类别:
Continuing Grant
财政年份:
1996
资助国家:
美国
项目状态:
已结题
起止时间:
1996-05-15 至 1999-12-31

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中文摘要
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英文摘要
9531696 Hull This research project aims, through combined experimental and theoretical work, for development of a process simulator for energetic, kinetic and electronic descriptions of misfit dislocations in strained layer semiconductor epitaxy. The primary goals of the program are to: provide a coherent framework and a repository for experimental data relati ng to misfit dislocations in strained layer epitaxy; incorporate mechanistic understanding of the different processes involved in plastic relaxation in strained layer epitaxy, and to combine this with experimental descriptions of these processes to enable predictive simulation of the extent of plastic relaxation as a function of thermal history du ring growth, annealing and materials processing; and to define quantitative relationships between the structure/density of misfit dislocation arrays and their electronic properties, and incorporate these relationships into the process simulator to allow modeling of device ramifications of plastic relaxation. The approach to these goals includes: a ddressing shortcomings in experimental descriptions of kinetic processes in plastic relaxation, especially the dislocation nucleation process; to quantitatively determine the effects of critical materials processing steps--implantation and activation/metallization/oxidation) upon plastic relaxation; to correlate misfit dislocation structure and densities with their effect on electronic properties of the host structure, and, to investigate the effects of device operation on the dislocation microstructure, and appropriate software development. The intent is to develop this concept such that at the conclusion of the program, the simulator will be available for general distribution within the scientific community. %%% The research will contribute basic materials science knowledge at the fundamental atomic level of technological relevance to several aspects of advanced microelectronic devices and integrated circuitry. Additional ly, the knowledge and understanding gained from this research project is expected to contribute in a general way to improving the perfor mance of advanced devices and circuits used in computing, information processing, and telecommunications by providing a fundamental understanding and a basis for designing and producing improved materials. An important feature of the program is the integration of research and education through the training of students in a fundamentally and techno logically significant area. *** _
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DMREF: Adaptive Control of Microstructure from the Microscale to the Macroscale
  • 批准号:
    1729336
  • 项目类别:
    Standard Grant
  • 资助金额:
    $152.43万
  • 财政年份:
    2017
  • 负责人:
    Robert Hull
  • 依托单位:
EAGER/DMREF: In-Situ Thermomechanical Processing and Measurement in the Scanning Electron Microscope
  • 批准号:
    1647005
  • 项目类别:
    Standard Grant
  • 资助金额:
    $23.86万
  • 财政年份:
    2016
  • 负责人:
    Robert Hull
  • 依托单位:
Integration of Computation, Experiment, Simulation and Data to Predict Defect Properties in Semiconductor Thin Films
  • 批准号:
    1309535
  • 项目类别:
    Continuing Grant
  • 资助金额:
    $60.0万
  • 财政年份:
    2013
  • 负责人:
    Robert Hull
  • 依托单位:
DMREF: Real Time Control of Grain Growth in Metals
  • 批准号:
    1334283
  • 项目类别:
    Standard Grant
  • 资助金额:
    $128.52万
  • 财政年份:
    2013
  • 负责人:
    Robert Hull
  • 依托单位:
国内基金
海外基金
Neural Process模型的多样化高保真技术研究
磁转动超新星爆发中weak r-process的关键核反应
多臂Bandit process中的Bayes非参数方法
  • 批准号:
    71771089
  • 项目类别:
    面上项目
  • 资助金额:
    48.0万元
  • 批准年份:
    2017
  • 负责人:
    吴贤毅
  • 依托单位: