Development of a Compact, Broad Range Magnetic Spectrometer for Ion Beam Analysis

该奖项旨在开发一种紧凑、宽范围的磁谱仪，用于材料研究的离子束分析。该光谱仪被设计用作卢瑟福后向散射（RBS）探测器，它将允许与现有系统一样容易和精确地测量RBS光谱，但具有十倍以上的能量分辨率。能量分辨率的这个数量级提高转化为RBS近地表深度和质量分辨率的一个数量级提高。使用该光谱仪，4HeRBS将具有质量分辨率优于（即小于）1amu的所有目标原子核，并将具有接近原子尺寸的近表面深度分辨率。该光谱仪的一个新特点是能够以180度为中心的大立体角测量RBS光谱，对所有目标质量的运动学展宽最小（dE/d=0）。扩展焦平面允许同时测量He+和He++离子的相对强度，以便校正电荷分数效应。虽然设计时主要考虑的是RBS的需求，但该光谱仪也可以作为核反应分析（NRA）和能量反冲检测（ERD）的探测器，在这些分析方法中，高能量分辨率将再次转化为深度分辨率的显着提高。该仪器可能会大大提高材料分析的能力，并将为学生提供培训。他将为工艺开发和器件制造提供重要的反馈。＊＊＊

9625960 Lanford This award is to develop a compact, broad range magnetic spectrometer to be used in ion beam analysis for materials research. This spectrometer is designed to be used as a detector for Rutherford backscattering (RBS) wihich will allow the measurement of RBS spectra with equal ease and precision as current systems, but with more than a factor of ten better energy resolution. This order of magnitude improvement in energy resolution translates into an order of magnitude improvement in the near surface depth and mass resolution of RBS. With this spectrometer, 4HeRBS will have mass resolution better than (i.e. smaller than) 1 amu for all target nuclei and will have a near surface depth resolution approaching atomic dimensions. One novel feature of this spectrometer is the ability to measure RBS spectra with a large solid angle centered at 180o where kinematic broadening is minimized (dE/d=0) for all target masses. An extended focal plane allows the simultaneous measurement of relative intensity of He+ and He++ ions in order to correct for charge fraction effects. Although designed with the needs of RBS as a primary concern, this spectrometer can also be sued as a detector in nuclear reaction analysis (NRA) and energy recoil detection (ERD), where the high energy resolution will again translate into dramatic improvement in the depth resolution attainable by these analytic methods. %%% This instrument is likely to provide substantially improved capability for materials analysis, and will provide training to students. He will provide important feedback for processing development and device fabrication. ***