Ninth International Conference on Molecular Beam Epitaxy; Pepperdine University, Malibu, California; August 5-9, 1996

第九届国际分子束外延会议；

• 批准号: 9628762
• 负责人: Kang Wang
• 金额: $ 0.5万
• 依托单位: University of California-Los Angeles
• 依托单位国家: 美国
• 项目类别: Standard Grant
• 财政年份: 1996
• 资助国家: 美国
• 起止时间: 1996-06-01 至 1997-05-31
• 项目状态: 已结题
• 来源: https://www.nsf.gov/awardsearch/showAward?AWD_ID=9628762&HistoricalAwards=false
• 关键词: Ninth; International; Conference; Molecular; Beam

9628762 Wang An International Conference on Molecular Beam Epitaxy(MBE) is being held to address new, more microscopic aspects of MBE phenomena. Chemical kinetic reactions and mechanisms in critical aspects of interfaces, thin film surface evolution and continuous film development during early stages of epitaxy of both compound and elemental semiconductors ar e being addressed through advanced processing and characterization techniques being studied by a new generation of young scientists. Current topics in semiconductor materials growth under lattice mismatch conditions, and related in situ advanced materials characterization are an integral part of the conference. There will be an opportunity to a ssess the field, and to establish ties between universities, research institutions, and industry. It is expected that top scientists in the field will attend, and that the Conference will provide an effective forum to discuss and delineate critical scientific issues in this important research area, and to consider and define the approaches and te chniques needed to address them. %%% An evaluation of the progress and status of Molecular Beam Epitaxy and related materials processing and characterization issues, especially critical materials research areas of hetero-epitaxy, processing, and the relationship of materials research to device and circuit fabrication along with current assessments of the most important developments in this field will be of great value to the understanding and enhanced utilization of advanced materials in the field of electronics and photonics. *** _

小行星9628762 一个关于分子束外延（MBE）的国际会议正在举行，以解决MBE现象的新的，更微观的方面。 通过新一代年轻科学家正在研究的先进加工和表征技术，解决了化合物和元素半导体外延早期阶段界面、薄膜表面演变和连续薄膜发展关键方面的化学动力学反应和机制。 目前的主题在半导体材料生长在晶格失配条件下，和相关的原位先进材料表征是会议的一个组成部分。 将有机会评估该领域，并在大学，研究机构和行业之间建立联系。 预计该领域的顶尖科学家将出席会议，会议将提供一个有效的论坛，讨论和界定这一重要研究领域的重要科学问题，并审议和确定解决这些问题所需的方法和技术。 %%% 对分子束外延的进展和现状以及相关材料的加工和表征问题进行了评价，特别是异质外延、加工、材料研究与器件和电路制造之间的关系，沿着目前对这一领域最重要的发展的评估，对于理解和加强利用先进材料，电子学和光子学领域。 *** _