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Investigation on Interface Reactions of Transition-Metal/Si Structures Induced By Ion Implantation

Investigation on Interface Reactions of Transition-Metal/Si Structures Induced By Ion Implantation
离子注入引起的过渡金属/硅结构界面反应的研究
批准号:
8011037
负责人:
Kang Wang
金额:
$14.65万
依托单位国家:
美国
项目类别:
Continuing Grant
财政年份:
1980
资助国家:
美国
项目状态:
已结题
起止时间:
1980-10-15 至 1986-03-31

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