Electron, Hole and Damage Migration in Site-Specifically Modified DNA Duplexes

本研究的重点是电子和“正空穴”在DNA中的迁移距离。工作模式是，光产生的电子和空穴从最初产生的位置迁移到发生链切割或氧化损伤的被移除的位置。光活性苯并(a)芘衍生物共价结合，位点特异性，与商业上可获得的具有确定碱基序列的DNA片段结合。这些系统中的链切割模式将通过高分辨率凝胶电泳建立，并与DNA链切割和氧化损伤的效率相关联，以评估电子-空穴迁移距离，以及生物聚合物中空穴引发氧化损伤和电子引发链切割发生的位置。光疗和光灭菌的应用主要集中在光活性试剂氧化损伤和/或切割DNA双链的机制上。获得该奖项后，Geacintov教授将阐明具有确定碱基序列的DNA片段中电荷迁移的距离，从而确定发生链切割和氧化损伤的位点。

This research focuses on the distance of electron and `positive hole` migration in DNA. The working paradigm is is that photogenerated electrons and holes migrate from the site of initial generation to removed sites at which strand cleavage or oxidative damage occurs. Photoactive benzo(a)pyrene derivatives are covalently bound, site-specifically, to commercially available DNA fragments with a defined base sequence. Strand cleavage patterns within these defined systems will be established by high resolution gel electrophoresis, and correlated with the efficiencies of DNA strand cleavage and oxidative damage to assess electron-hole migration distances, and the sites within the biopolymer at which hole-initiated oxidative damage, and electron-initiated strand cleavage occur. Phototherapeutic and photosterilization applications have focused attention on the mechanism by which photoactive reagents oxidatively damage and/or cleave DNA duplexes. With this award, Professor Geacintov will elucidate the distances of charge migration in DNA fragments having a defined base sequence thereby identifying the sites at which strand cleavage and oxidative damage occur.