Control of Distributed Nonlinear Systems and Semiconductor Manufacturing

ECS-9700588 Tannenbaum 该建议涉及的偏微分方程方法的分布式和非线性系统的控制。 特别是，重点是某些关键半导体制造工艺的基准领域，包括蚀刻，沉积和光刻。 我们还将讨论一些新的方向，我们正在采取的分布参数系统的鲁棒控制使用斜Toeplitz理论。 这使得人们可以减少H的设计 有限维线性代数问题的最优和次优补偿器，其维数仅取决于权重的McMillan度，而不取决于对象的（状态空间）维数。 因此，即使对于无限维系统，我们也被简化为有限矩阵操作。 我们还将考虑这些想法的一些随时间变化的推广。

ECS-9700588 Tannenbaum The proposal deals with partial differential equation methods for the control of distributed and nonlinear systems. In particular, the focus is on the benchmark area of certain key semiconductor manufacturing processes including etching, deposition and lithography. We will also discuss some new directions we are taking on the robust control of distributed parameter systems using skew Toeplitz theory. This allows one to reduce the design of H -optimal and suboptimal compensators to finite dimensional linear algebra problem, the dimension of which only depends on the McMillan degrees of the weights and not the (state-space) dimension of the plant. Thus even for infinite dimensional systems, we are reduced to finite matrix manipulations. We will also consider some time-varying generalizations of these ideas.