Acquisition of a Pulse Excimer Laser for Polymer Engineeringand Crystal Growth Research

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An MRI award will support purchase of an excimer multigas pulse laser with 157 to 351 nm wavelength range(F2,ArF,KrF,XeCl,XeF), and with 300 mJ maximum pulse energy,as well as the related optics and accessories. The equipment will be used for research in the fields of polymer engineering and crystal growth, in particular polymer machining, metal substrate adhesion pretreatment by ablation, control of crystal growth processes, and multiphase interface control applications in general. Additionally, in response to the rapid growth in the usage of laser processing of polymers in the electronics and precision and micro-machining industries the equipment well also be used in the training of graduate and undergraduate students, as well as affiliates from relevant training centers.