Acquisition of a Pulse Excimer Laser for Polymer Engineeringand Crystal Growth Research

核磁共振奖励将支持购买波长范围为157至351 nm的准分子多气体脉冲激光器(F2、ARF、Krf、XeCl、Xef)，最大脉冲能量为300 MJ，以及相关的光学元件和附件。该设备将用于聚合物工程和晶体生长领域的研究，特别是聚合物加工、烧蚀金属基片粘合前处理、晶体生长过程控制以及一般的多相界面控制应用。此外，随着激光加工聚合物在电子、精密和微机械加工行业中的使用快速增长，该设备也可用于研究生和本科生以及相关培训中心的附属机构的培训。

An MRI award will support purchase of an excimer multigas pulse laser with 157 to 351 nm wavelength range(F2,ArF,KrF,XeCl,XeF), and with 300 mJ maximum pulse energy,as well as the related optics and accessories. The equipment will be used for research in the fields of polymer engineering and crystal growth, in particular polymer machining, metal substrate adhesion pretreatment by ablation, control of crystal growth processes, and multiphase interface control applications in general. Additionally, in response to the rapid growth in the usage of laser processing of polymers in the electronics and precision and micro-machining industries the equipment well also be used in the training of graduate and undergraduate students, as well as affiliates from relevant training centers.