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Periodic Structures in the Study and Control of Surface Microtopography and Lattice Strain

Periodic Structures in the Study and Control of Surface Microtopography and Lattice Strain
表面微形貌和晶格应变研究与控制中的周期结构
批准号:
9725082
负责人:
John Blakely
金额:
$0.0万
依托单位:
依托单位国家:
美国
项目类别:
Continuing grant
财政年份:
1998
资助国家:
美国
项目状态:
已结题
起止时间:
1998-03-01 至 2001-06-30

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中文摘要
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英文摘要
9725082 Blakely This project utilizes periodic structures for fundamental studies of the dynamics of semiconductor surfaces, the production of stepfree substrates, and oxidation of high aspect-ratio nanostructures. The evolution of mesoscale structure will be studied in a context in which connection to the underlying physical mechanisms and appropriate theoretical approach to describing macroscopic structure evolution are addressed. Focus of the project is on fundamental understanding and control of surface structural defects, the kinetics of surface morphological changes, and the effect of morphology on lattice strain in the near-surface region. Initially most of the experiments will be done with silicon, but extension to other materials, Ge, C, GaAs and SiGe alloys will be considered. Major experimental methods for the structural and kinetic studies will be scanning tunneling and atomic force microscopy, low energy electron diffraction and microscopy and surface X-ray diffraction. Conventional nanofabrication methods of sample preparation will be complemented by novel techniques to create periodically patterned surfaces of very small periods. %%% The project addresses basic research issues in a topical area of materials science having high technological relevance. The research will contribute basic materials science knowledge at a fundamental level to important aspects of electronic/photonic devices. Experimental tools are now available to allow atomic level observation of elementary surface processes which when better understood will allow advances in both fundamental science and technology. The basic knowledge and understanding gained from the research is expected to contribute to improving the perform ance and stability of advanced devices and circuits by providing a fundamental understanding and a basis for designing and producing improved materials, and materials combinations. An important feature of the program is the integration of researc h and education through the training of students in a fundamentally and technologically significant area. ***
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Control of Microtopography at Silicon Surfaces and Interfaces
  • 批准号:
    0109641
  • 项目类别:
    Continuing grant
  • 资助金额:
    $0.0万
  • 财政年份:
    2001
  • 负责人:
    John Blakely
  • 依托单位:
Surface Microtopography, Atom Transport and Epitaxial Growth
  • 批准号:
    9313371
  • 项目类别:
    Continuing Grant
  • 资助金额:
    $30.0万
  • 财政年份:
    1994
  • 负责人:
    John Blakely
  • 依托单位:
Surface, Defects, Atom Transport and Epitaxial Growth
  • 批准号:
    9201410
  • 项目类别:
    Standard Grant
  • 资助金额:
    $0.0万
  • 财政年份:
    1992
  • 负责人:
    John Blakely
  • 依托单位:
Surface Defects: Their Role in Atom Transport and Surface Phase Transitions
  • 批准号:
    8820362
  • 项目类别:
    Continuing grant
  • 资助金额:
    $0.0万
  • 财政年份:
    1989
  • 负责人:
    John Blakely
  • 依托单位:
海外基金