SBIR Phase I: Planar Magnetic Levitation Technology for Precision Microelectronics Manufacturing Equipment

SBIR第一期：精密微电子制造设备平面磁悬浮技术

• 批准号: 9860697
• 负责人: Won-jong Kim
• 金额: $ 10万
• 依托单位: SATCON TECHNOLOGY CORPORATION
• 依托单位国家: 美国
• 项目类别: Standard Grant
• 财政年份: 1999
• 资助国家: 美国
• 起止时间: 1999-01-01 至 1999-06-30
• 项目状态: 已结题
• 来源: https://www.nsf.gov/awardsearch/showAward?AWD_ID=9860697&HistoricalAwards=false
• 关键词: SBIR; Phase; Planar; Magnetic; Levitation

9860697 This Small Business Innovation Research Phase I project presents a planar magnetic levitator/positioner for precision microelectronics manufacturing equipment applications. This technology is based on the proof-of-concept magnetic levitation stage developed by the Principal Investigator during his doctoral research at the Massachusetts Institute of Technology. The maglev stage described in this proposal is the first to provide all the motions required for photolithography in semiconductor manufacturing with a single magnetically levitated platen. The platen is driven in all six-degree-of-freedom motions with small adjustments for focusing and alignment and large planar motions for positioning across the wafer surface. In this project, the feasibility and the performance limitation of the planar magnetic levitation technology will be investigated. Currently, three foreign companies share 80% of the photolithography wafer stepper market. The proposed technology herein may be a corner stone for the U.S. to solidify the leadership position in the highly profitable and competitive microelectronics manufacturing capital equipment business. Besides wafer steppers, this technology can be applied to other manufacturing equipment that require precise planar position control, such as wire bonders, surface profilometers, scanned probe microscopes, and precision inspection machines.

9860697 这个小型企业创新研究第一阶段项目提出了一个平面磁悬浮器/定位器的精密微电子制造设备的应用。该技术基于主要研究者在马萨诸塞州理工学院博士研究期间开发的概念验证磁悬浮平台。在这个建议中描述的磁悬浮平台是第一个提供所有的运动所需的光刻在半导体制造与一个单一的磁悬浮压板。该平台被驱动在所有六个自由度的运动与小的调整，聚焦和对准和大的平面运动，在整个晶片表面上的定位。本计画将探讨平面磁悬浮技术的可行性与性能限制。 目前，三家外国公司分享了80%的光刻晶圆步进机市场。本文提出的技术可能是美国巩固在高利润和竞争力的微电子制造资本设备业务中的领导地位的基石。除了晶圆步进机之外，该技术还可以应用于其他需要精确平面位置控制的制造设备，如引线键合机、表面轮廓仪、扫描探针显微镜和精密检测机。