SBIR Phase I: Planar Magnetic Levitation Technology for Precision Microelectronics Manufacturing Equipment

小型企业创新研究第一阶段项目介绍了一种用于精密微电子制造设备的平面磁悬浮/定位器。这项技术是基于概念验证的磁悬浮阶段，由首席研究员在麻省理工学院的博士研究期间开发的。本提案中描述的磁悬浮平台是第一个用单个磁悬浮平台提供半导体制造光刻所需的所有运动的平台。压板在所有六自由度运动中驱动，用于聚焦和对准的小调整以及用于在晶圆表面定位的大平面运动。本课题将对平面磁悬浮技术的可行性和性能限制进行研究。目前，三家外国公司占据了80%的光刻晶圆步进市场。这里提出的技术可能是美国在高利润和竞争激烈的微电子制造资本设备业务中巩固领导地位的基石。除了晶圆步进器外，该技术还可以应用于其他需要精确平面位置控制的制造设备，如线键合机，表面轮廓仪，扫描探针显微镜和精密检测机。

9860697 This Small Business Innovation Research Phase I project presents a planar magnetic levitator/positioner for precision microelectronics manufacturing equipment applications. This technology is based on the proof-of-concept magnetic levitation stage developed by the Principal Investigator during his doctoral research at the Massachusetts Institute of Technology. The maglev stage described in this proposal is the first to provide all the motions required for photolithography in semiconductor manufacturing with a single magnetically levitated platen. The platen is driven in all six-degree-of-freedom motions with small adjustments for focusing and alignment and large planar motions for positioning across the wafer surface. In this project, the feasibility and the performance limitation of the planar magnetic levitation technology will be investigated. Currently, three foreign companies share 80% of the photolithography wafer stepper market. The proposed technology herein may be a corner stone for the U.S. to solidify the leadership position in the highly profitable and competitive microelectronics manufacturing capital equipment business. Besides wafer steppers, this technology can be applied to other manufacturing equipment that require precise planar position control, such as wire bonders, surface profilometers, scanned probe microscopes, and precision inspection machines.