Fundamental Processes in Plasmas
Fundamental Processes in Plasmas
批准号:
9876999
负责人:
Thomas O'Neil
金额:
$277.58万
依托单位国家:
美国
项目类别:
Continuing Grant
财政年份:
1999
资助国家:
美国
项目状态:
已结题
起止时间:
1999-05-15 至 2004-07-31
中文摘要
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英文摘要
9876999O'NeilThe research focuses on fundamental processes in plasmas for which precise experimental tests of theory can be made. Experiments are performed on non-neutral plasmas using three, existing electron traps. The simplicity of these systems facilitates precise comparisons between theory/simulation and experiment. This enables a depth of understanding rarely possible in neutral plasmas in complex geometries.
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Fundamental Processes in Plasmas
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批准号:0903877
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项目类别:Continuing Grant
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资助金额:$200.0万
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财政年份:2009
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负责人:Thomas O'Neil
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依托单位:
FUNDAMENTAL PROCESSES IN PLASMAS
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批准号:0354979
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项目类别:Continuing Grant
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资助金额:$300.0万
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财政年份:2004
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负责人:Thomas O'Neil
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依托单位:
Fundamental Processes in Plasmas
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批准号:9421318
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项目类别:Continuing Grant
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资助金额:$222.33万
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财政年份:1995
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负责人:Thomas O'Neil
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依托单位:
国内基金
海外基金
Submesoscale Processes Associated with Oceanic Eddies
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批准号:--
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项目类别:--
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资助金额:160万元
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批准年份:2022
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负责人:董昌明
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依托单位: