POWRE: Thin Film Magnets Via Reactive RF Co-Sputtering

POWRE:通过反应射频共溅射制备薄膜磁体

基本信息

  • 批准号:
    9973727
  • 负责人:
  • 金额:
    $ 7.5万
  • 依托单位:
  • 依托单位国家:
    美国
  • 项目类别:
    Standard Grant
  • 财政年份:
    1999
  • 资助国家:
    美国
  • 起止时间:
    1999-07-01 至 2001-06-30
  • 项目状态:
    已结题

项目摘要

This project explores the intrinsic and extrinsic magnetic properties of permanent Sm/Nd:Fe/Co:N magnet films made via reactive rf co-sputtering for fine control of alloy composition. Reactive sputtering also allows precise in-situ insertion of nitrogen interstitials to enhance magnetic properties, such as elevated Curie temperatures, while reducing the number of processing steps. The effect of microstructural features, such as grain size and secondary phases, on the magnetic properties will be investigated. These features will be controlled through processing parameters, such as forward power, sputtering pressure, and substrate temperature, as well as through substitutional alloying additions such as Mo, Ti, V, Zr, Cu and C. An important aspect of the project is the clarification of phase diagrams and resulting microstructure-property relationships of sputtered compounds, which may vary substantially from equilibrium values.%%%This is a research enhancement grant made under the Professional Opportunities for Women in Research and Education (POWRE) program. This research has relevance to magnetic recording media, microelectromechanical systems, microsensors, micromotors and integrated isolators and circulators in photonic integrated circuits as well as monolithic microwave integrated circuits. The project also aims to enhance undergraduate, graduate, and underrepresented student research and to develop undergraduate and graduate courses in the area of thin film processing and optoelectronics. This project will also enhance the PI's current activities in K-12 outreach. The project is co-supported by the Division of Materials Research, and the MPS OMA(Office of Multidisciplinary Activities). ***
该项目探讨了通过反应射频共溅射制备的永久Sm/Nd:Fe/Co:N磁体薄膜的本征和非本征磁性能,以精细控制合金成分。反应溅射还允许精确地原位插入氮材料以增强磁性,例如提高居里温度,同时减少处理步骤的数量。微观结构特征,如晶粒尺寸和第二相,对磁性能的影响将进行研究。这些特征将通过工艺参数(例如正向功率、溅射压力和衬底温度)以及通过替代合金添加物(例如Mo、Ti、V、Zr、Cu和C)来控制。该项目的一个重要方面是澄清相图和溅射化合物的微观结构-性能关系,这些关系可能与平衡值有很大差异。这是根据研究和教育领域妇女专业机会方案提供的一项研究增强补助金。这项研究与磁记录介质,微机电系统,微传感器,微电机和集成隔离器和环行器的光子集成电路以及单片微波集成电路。该项目还旨在加强本科生、研究生和代表性不足的学生的研究,并开发薄膜加工和光电子领域的本科生和研究生课程。该项目还将加强PI目前在K-12外展方面的活动。该项目由材料研究部和MPS OMA(多学科活动办公室)共同支持。***

项目成果

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Bethanie Stadler其他文献

Nanomagnetic Materials Fabrication, Characterization and Application
纳米磁性材料的制备、表征及应用
  • DOI:
  • 发表时间:
    2021
  • 期刊:
  • 影响因子:
    0
  • 作者:
    Akinobu Yamaguchi;Atsufumi Hirohata;Bethanie Stadler
  • 通讯作者:
    Bethanie Stadler
Nanomagnetic Materials
纳米磁性材料
  • DOI:
  • 发表时间:
    2021
  • 期刊:
  • 影响因子:
    0
  • 作者:
    Akinobu Yamaguchi;Atsufumi Hirohata;Bethanie Stadler
  • 通讯作者:
    Bethanie Stadler

Bethanie Stadler的其他文献

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{{ truncateString('Bethanie Stadler', 18)}}的其他基金

I-Corps: Processing of high-performance optical isolator materials using magneto-optical garnets on Si wafers
I-Corps:在硅晶圆上使用磁光石榴石加工高性能光学隔离器材料
  • 批准号:
    2043044
  • 财政年份:
    2021
  • 资助金额:
    $ 7.5万
  • 项目类别:
    Standard Grant
Roll-Imprint Manufacturing of Three-Dimensional Nanomagnetic Arrays
三维纳米磁性阵列的滚压印制造
  • 批准号:
    1762884
  • 财政年份:
    2018
  • 资助金额:
    $ 7.5万
  • 项目类别:
    Standard Grant
Fully-integrated Isolators for Silicon Photonics using WAMO (Wrap Around Magneto-Optics)
使用 WAMO(环绕磁光)的全集成硅光子隔离器
  • 批准号:
    1708887
  • 财政年份:
    2017
  • 资助金额:
    $ 7.5万
  • 项目类别:
    Standard Grant
Support of US Graduate Student for 2015 Magnetism Summer. To Be Held in Minneapolis St. Paul Minnesota on June 14-19, 2015
2015 年磁力暑期美国研究生支持。
  • 批准号:
    1543987
  • 财政年份:
    2015
  • 资助金额:
    $ 7.5万
  • 项目类别:
    Standard Grant
Materials World Network: Complex Oxides for Heterogeneous Optoelectronic Integration
材料世界网:用于异质光电集成的复杂氧化物
  • 批准号:
    1210818
  • 财政年份:
    2012
  • 资助金额:
    $ 7.5万
  • 项目类别:
    Standard Grant
Collaborative Research: Understanding Magnetostrictive Galfenol Physics for Micro- and Nano-scale Devices
合作研究:了解微型和纳米级器件的磁致伸缩加酚物理
  • 批准号:
    1231993
  • 财政年份:
    2012
  • 资助金额:
    $ 7.5万
  • 项目类别:
    Continuing Grant
GOALI/Collaborative Research: Ferromagnetic Nanowires for Bio-inspired Microfluidic NanoElectroMechanical Systems (NEMS)
GOALI/合作研究:用于仿生微流控纳米机电系统 (NEMS) 的铁磁纳米线
  • 批准号:
    1000863
  • 财政年份:
    2010
  • 资助金额:
    $ 7.5万
  • 项目类别:
    Standard Grant
Monolithically Integrated Nonreciprocal Garnet Devices on Semiconductor Platforms
半导体平台上的单片集成不可逆石榴石器件
  • 批准号:
    0901321
  • 财政年份:
    2009
  • 资助金额:
    $ 7.5万
  • 项目类别:
    Standard Grant
SGER: Monolithically Integrated Garnet Isolators on Si
SGER:硅上单片集成石榴石隔离器
  • 批准号:
    0834627
  • 财政年份:
    2008
  • 资助金额:
    $ 7.5万
  • 项目类别:
    Standard Grant
2006 GOALI GRANTEES WORKSHOP TO BE HELD AT NSF ON FEB. 16-17, 2006.
2006 年 Goali 受资助者研讨会将于 2 月在 NSF 举行
  • 批准号:
    0620104
  • 财政年份:
    2006
  • 资助金额:
    $ 7.5万
  • 项目类别:
    Standard Grant

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High-performance thin film porous pyroelectric materials and composites for thermal sensing and harvesting
用于热传感和收集的高性能薄膜多孔热释电材料和复合材料
  • 批准号:
    EP/Y017412/1
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Understanding the synthesis and electronic behavior of beta tungsten thin film materials
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Exact薄膜陶瓷涂层材料的开发
  • 批准号:
    10076171
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    2023
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    $ 7.5万
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    Grant for R&D
FuSe-TG: Reconfigurable Threshold Logic via Flexible Thin Film Electronics: A Pathway to Semiconductor Workforce Development
FuSe-TG:通过柔性薄膜电子器件的可重构阈值逻辑:半导体劳动力发展的途径
  • 批准号:
    2235385
  • 财政年份:
    2023
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    $ 7.5万
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使用薄膜多层系统的新型反铁磁拓扑自旋结构及其功能
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金属磁性/非磁性超薄膜异质结构探测太赫兹波的研究
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