RUI: Fundamental Studies of Zinc Oxide Deposition by Reactive Magnetron Sputtering

RUI：反应磁控溅射氧化锌沉积的基础研究

• 批准号: 9973934
• 负责人: James Doyle
• 金额: $ 22.26万
• 依托单位: Macalester College
• 依托单位国家: 美国
• 项目类别: Continuing Grant
• 财政年份: 1999
• 资助国家: 美国
• 起止时间: 1999-06-01 至 2003-05-31
• 项目状态: 已结题
• 来源: https://www.nsf.gov/awardsearch/showAward?AWD_ID=9973934&HistoricalAwards=false
• 关键词: RUI; Fundamental; Studies; Zinc; Oxide

This project addresses zinc oxide (ZnO) thin film deposition by reactive magnetron sputtering, with emphasis on the role of energy and momentum flux into the surface during growth in determining film properties. The plasma density and ion energy at the substrate will be systematically varied using magnetron unbalancing and an external magnetic field and radio frequency bias. The plasma characteristics will be assessed using standard plasma probes. Monte Carlo simulations of sputter atom transport will be used to study the nature, energy, and flux of energetic neutral bombardment. These data will be correlated with compositional, structural, optical, and electrical properties of the resulting ZnO films as determined by Rutherford Back Scattering, x-ray diffraction, scanning electron microscopy, conductivity and Hall effect, and transmission and reflection spectroscopy. The research is expected to elucidate specific chemical and physical effects of energy-/momentum flux on ZnO thin film growth and thereby provide a sound scientific basis for further optimization of this technologically important material. %%%The project addresses basic research issues in a topical area of materials science having potential technological relevance. Zinc oxide is an important transparent conducting material that finds extensive application in photovoltaic cells, flat panel displays, and other thin film technologies. The research will contribute basic materials science knowledge at a fundamental level which will be relevant to performance of advanced applications of this type in electronics/photonics. An important feature of the program is the integration of research and education through the training of students in a fundamentally and technologically significant area. The project will be carried out in collaboration with undergraduate research assistants, providing valuable research training and experience for future scientists and engineers, as well as enhancing the research environment of Macalester College, an undergraduate-only institution. ***

该项目致力于通过反应磁控溅射沉积氧化锌 (ZnO) 薄膜，重点关注生长过程中进入表面的能量和动量通量在确定薄膜特性方面的作用。使用磁控管不平衡以及外部磁场和射频偏置，将系统地改变基底处的等离子体密度和离子能量。将使用标准等离子体探针评估等离子体特性。溅射原子输运的蒙特卡罗模拟将用于研究高能中性轰击的性质、能量和通量。这些数据将与所得 ZnO 薄膜的成分、结构、光学和电学性质相关，如通过卢瑟福背散射、X 射线衍射、扫描电子显微镜、电导率和霍尔效应以及透射和反射光谱测定。该研究有望阐明能量/动量通量对 ZnO 薄膜生长的具体化学和物理影响，从而为进一步优化这种技术上重要的材料提供良好的科学基础。 %%%该项目解决了具有潜在技术相关性的材料科学主题领域的基础研究问题。氧化锌是一种重要的透明导电材料，广泛应用于光伏电池、平板显示器和其他薄膜技术。该研究将从根本上贡献基础材料科学知识，这将与电子/光子学中此类先进应用的性能相关。该计划的一个重要特点是通过在基础和技术重要领域对学生进行培训，将研究和教育结合起来。该项目将与本科生研究助理合作开展，为未来的科学家和工程师提供宝贵的研究培训和经验，并改善马卡莱斯特学院这一本科生院校的研究环境。 ***