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GOALI: Understanding Laser and Electron Beam Chemical Vapor Deposition Processes from Macro to Nanoscales

GOALI: Understanding Laser and Electron Beam Chemical Vapor Deposition Processes from Macro to Nanoscales
目标:了解从宏观到纳米尺度的激光和电子束化学气相沉积过程
批准号:
0300293
负责人:
W. Jack Lackey
金额:
$15.0万
依托单位国家:
美国
项目类别:
Standard Grant
财政年份:
2003
资助国家:
美国
项目状态:
已结题
起止时间:
2003-08-15 至 2007-01-31

项目摘要

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中文摘要
翻译
GOALI项目的目标是建立一个电子束化学气相沉积系统,并确定其用于制造纳米材料和器件的可行性。电子束已被证明与吸附在固体衬底表面的化学物质相互作用,引起化学反应,导致固体金属或陶瓷沉积到衬底上(S)。通过相对于衬底移动光束,可以制造出三维结构和器件。由于电子束可以聚焦到1纳米量级的光斑尺寸,因此制造纳米级器件应该是可能的。其目的将是确定如何对商业上可用的电子显微镜进行改造,以开发可靠而通用的电子束化学气相沉积(EB-CVD)系统。根据这一设计任务,将采购设备并对其进行进一步改装,以允许进行EB-CVD实验。这些实验将允许确定所建议的EB-CVD工艺用于沉积硅和制造纳米结构的可行性。这些实验还将有助于理解电子束与吸附的化学物质(S)相互作用形成金属和陶瓷沉积的机理。电子束沉积提供了一种真正适用于纳米级的新的节能制造技术。原位研究沉积物的形核和生长将大大提高对这些现象的理解,这些现象对于控制沉积物的几何形状和性质是至关重要的。由于EB-CVD适用于广泛的金属和陶瓷,这项研究将影响电子/光子学、MEMS、纳米技术和高温材料等领域当前和未来器件、传感器和结构的关键材料的合成。与工业伙伴的互动将使开发适合研究和制造的商业EB-CVD系统成为可能。佐治亚理工学院将建立的系统将促进本科生和研究生的培训,包括代表人数不足的群体。
英文摘要
The objective of this Grant Opportunities for Academic Liaison with Industry (GOALI) project is to build an electron beam chemical vapor deposition system and determine its feasibility for the fabrication of nanoscale materials and devices. An electron beam has been shown to interact with chemicals that are adsorbed onto the surface of a solid substrate causing a chemical reaction(s) that leads to the deposition of a solid metal or ceramic onto the substrate. By moving the beam relative to the substrate, 3-D structures and devices can be fabricated. Since electron beams can be focused to spot sizes on the order of 1 nm, it should be possible to fabricate nanoscale devices. The aim will be to determine how a commercially available electron microscope could be modified in order to develop a reliable, yet versatile, electron beam chemical vapor deposition (EB-CVD) system. Following this design task, the equipment will be procured and further modified to permit EB-CVD experiments. The experiments will permit determining the feasibility of the proposed EB-CVD process for the deposition of silicon and for the fabrication of nanoscale structures. The experiments will also permit developing an understanding of the mechanisms by which the electron beam interacts with the adsorbed chemical(s) to form metal and ceramic deposits.Deposition with an electron beam offers a new energy efficient manufacturing technique truly applicable at the nano-level. In-situ examination of deposit nucleation and growth will greatly enhance the understanding of these phenomena which are critical to control of deposit geometry and properties. Since EB-CVD is applicable to a wide range of metals and ceramics, the research will impact synthesis of critical materials for current and future devices, sensors, and structures in areas as diverse as electronics/photonics, MEMS, nanotechnology, and high temperature materials. Interaction with industrial partners will permit development of a commercial EB-CVD system that is appropriate for both research and manufacturing. The system to be built at Georgia Tech will facilitate training of undergraduate and graduate students, including underrepresented groups.
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