GOALI: Understanding Laser and Electron Beam Chemical Vapor Deposition Processes from Macro to Nanoscales

目标：了解从宏观到纳米尺度的激光和电子束化学气相沉积过程

• 批准号: 0300293
• 负责人: W. Jack Lackey
• 金额: $ 15万
• 依托单位: Georgia Tech Research Corporation
• 依托单位国家: 美国
• 项目类别: Standard Grant
• 财政年份: 2003
• 资助国家: 美国
• 起止时间: 2003-08-15 至 2007-01-31
• 项目状态: 已结题
• 来源: https://www.nsf.gov/awardsearch/showAward?AWD_ID=0300293&HistoricalAwards=false
• 关键词: GOALI; Understanding; Laser; Electron; Beam

The objective of this Grant Opportunities for Academic Liaison with Industry (GOALI) project is to build an electron beam chemical vapor deposition system and determine its feasibility for the fabrication of nanoscale materials and devices. An electron beam has been shown to interact with chemicals that are adsorbed onto the surface of a solid substrate causing a chemical reaction(s) that leads to the deposition of a solid metal or ceramic onto the substrate. By moving the beam relative to the substrate, 3-D structures and devices can be fabricated. Since electron beams can be focused to spot sizes on the order of 1 nm, it should be possible to fabricate nanoscale devices. The aim will be to determine how a commercially available electron microscope could be modified in order to develop a reliable, yet versatile, electron beam chemical vapor deposition (EB-CVD) system. Following this design task, the equipment will be procured and further modified to permit EB-CVD experiments. The experiments will permit determining the feasibility of the proposed EB-CVD process for the deposition of silicon and for the fabrication of nanoscale structures. The experiments will also permit developing an understanding of the mechanisms by which the electron beam interacts with the adsorbed chemical(s) to form metal and ceramic deposits.Deposition with an electron beam offers a new energy efficient manufacturing technique truly applicable at the nano-level. In-situ examination of deposit nucleation and growth will greatly enhance the understanding of these phenomena which are critical to control of deposit geometry and properties. Since EB-CVD is applicable to a wide range of metals and ceramics, the research will impact synthesis of critical materials for current and future devices, sensors, and structures in areas as diverse as electronics/photonics, MEMS, nanotechnology, and high temperature materials. Interaction with industrial partners will permit development of a commercial EB-CVD system that is appropriate for both research and manufacturing. The system to be built at Georgia Tech will facilitate training of undergraduate and graduate students, including underrepresented groups.

这个赠款机会学术联络与工业（GOALI）项目的目标是建立一个电子束化学气相沉积系统，并确定其可行性的纳米材料和器件的制造。 电子束已经显示出与吸附到固体基底表面上的化学品相互作用，引起化学反应，该化学反应导致固体金属或陶瓷沉积到基底上。 通过相对于衬底移动光束，可以制造3D结构和器件。 由于电子束可以聚焦到1 nm量级的光斑大小，因此应该可以制造纳米级器件。 其目的是确定如何商业上可用的电子显微镜可以修改，以开发一个可靠的，但多功能的，电子束化学气相沉积（EB-CVD）系统。 在此设计任务之后，将采购设备并进一步修改，以允许EB-CVD实验。 实验将允许确定所提出的EB-CVD工艺的硅的沉积和纳米级结构的制造的可行性。 这些实验还将有助于理解电子束与吸附的化学物质相互作用形成金属和陶瓷沉积物的机制。电子束沉积提供了一种真正适用于纳米级的新的节能制造技术。 对存款成核和生长的原位检查将大大提高对这些现象的理解，这些现象对于控制存款的几何形状和性能至关重要。 由于EB-CVD适用于广泛的金属和陶瓷，该研究将影响当前和未来电子/光子学，MEMS，纳米技术和高温材料等领域的器件，传感器和结构的关键材料的合成。 与工业合作伙伴的互动将允许开发一个商业EB-CVD系统，这是适合研究和制造。 将在格鲁吉亚理工学院建立的系统将促进本科生和研究生的培训，包括代表性不足的群体。