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Acquisition of a Plasma Science Research and Research Training Laboratory at UTD.

Acquisition of a Plasma Science Research and Research Training Laboratory at UTD.
收购 UTD 等离子体科学研究和研究培训实验室。
批准号:
0079783
负责人:
Lawrence Overzet
金额:
$58.0万
依托单位国家:
美国
项目类别:
Standard Grant
财政年份:
2000
资助国家:
美国
项目状态:
已结题
起止时间:
2000-08-15 至 2003-07-31

项目摘要

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中文摘要
翻译
CTS-0079783 Lawrence J. Overzet德克萨斯大学达拉斯分校MRI:收购等离子体科学研究和研究培训实验室摘要收购和开发等离子体科学教学和研究实验室是德克萨斯大学达拉斯分校工程与计算机科学学院和自然科学与数学学院5名教师的共同努力。实验室开发提供了五个不同的等离子体站,每个系统上都有相关的诊断。五个等离子体发生系统及其诊断为学生提供了多样化的研究培训体验。由于这些等离子体系统被选择来反映教师的研究兴趣,这个实验室也为PI提供了一个肥沃的研究环境。所安装的设备如下:1)具有残余气体分析仪、傅立叶变换红外(FTIR)光谱仪和吸收光谱(AS)系统的电感耦合等离子体(ICP)系统; 2)用于具有光发射光谱(OES)和沉积膜分析的膜的溅射沉积的直流/脉冲磁控管源; 3)具有微波干涉仪和朗缪尔探针的空心阴极放电源; 4)具有FTIR光谱仪、沉积膜分析、朗缪尔探针和电流-电压探针的dc/rf平行板等离子体源;和5]具有OES、AS和电流-电压测量能力的各种灯。等离子体科学实验室为工程和自然科学的本科生(高级)和研究生提供研究培训能力。 它包括一个强大的教学组成部分,与当地产业的需求产生共鸣,并可能进一步解决行业的需求。它也将被用来培养非传统的学生。在半导体加工(蚀刻沉积和掺杂),照明等离子体和空间等离子体的广泛的研究背景和研究人员的兴趣,让学生,以及来自当地行业的技术和研究人员,了解基本的等离子体工艺和诊断等离子体科学和技术的不断扩大的领域。该实验室还增强了五名合作研究人员沿着其他研究人员的研究能力和团队合作。该实验室位于现代化的洁净室设施中,因此该设备适用于材料加工,设备制造和照明方面的研究培训和高级研究计划。
英文摘要
CTS-0079783Lawrence J. OverzetUniversity of Texas at DallasMRI: Acquisition of a Plasma Science Research and Research Training LaboratoryAbstractThe acquisition and development of a plasma science teaching and research laboratory is a joint effort among 5 faculty members in the Schools of Engineering and Computer Science and Natural Science and Mathematics at the University of Texas at Dallas. The laboratory development provides five distinct plasma stations with related diagnostics on each system. The five plasma-generation systems and the diagnostics for them offer a diverse research-training experience for students. As these plasma systems were chosen to reflect the research interests of the faculty, this laboratory also provides a fertile research environment for the PIs. The facilities installed are the following: 1] an inductively coupled plasma (ICP) system with a residual gas analyzer, a Fourier Transform Infrared (FTIR) spectrometer, and an Absorption Spectroscopy (AS) system; 2] a dc/pulsed magnetron source for sputter deposition of films with optical emission spectroscopy (OES) and deposited film analysis; 3] a hollow cathode discharge source with a microwave interferometer and Langmuir probes; 4] a dc/rf parallel plate plasma source with an FTIR spectrometer, deposited film analysis, Langmuir probe and current-voltage probes; and 5] various lamps with OES, AS, and current-voltage measurement capabilities. The plasma science laboratory provides a research training capability at UTD for both undergraduate (upper level) and graduate students in Engineering and the Natural Sciences. It encompasses a strong teaching component, resonates with the needs of local industry, and can potentially address needs of further removed industry. It will undoubtedly be used to train non-traditional students as well. The extensive research backgrounds and interests of the investigators in semiconductor processing (etching deposition and doping), lighting plasmas, and space plasmas allow students, as well as technical and research staff from local industry, to learn about basic plasma processes and diagnostics in the expanding fields of plasma science and technology. The Laboratory also enhances the research capabilities and teaming of the five collaborating researchers along with other investigators in both academe and industry. The lab is housed in modern clean room facilities, and consequently the equipment is suitable for both research training and for advanced research programs in materials processing, device manufacturing, and lighting.
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国内基金
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