CAREER: Reactive Radical Interactions with Clean and Adsorbate Covered Semiconductor Surfaces

职业：与清洁和吸附物覆盖的半导体表面的反应性自由基相互作用

• 批准号: 0094311
• 负责人: Sean Casey
• 金额: --
• 依托单位: Board of Regents, NSHE, obo University of Nevada, Reno
• 依托单位国家: 美国
• 项目类别: Standard Grant
• 财政年份: 2001
• 资助国家: 美国
• 起止时间: 2001-04-15 至 2007-09-30
• 项目状态: 已结题
• 来源: https://www.nsf.gov/awardsearch/showAward?AWD_ID=0094311&HistoricalAwards=false
• 关键词: CAREER; Reactive; Radical; Interactions; Clean

This CAREER project, supported in the Analytical and Surface Chemistry Program, addresses the detailed interactions of reactive radicals with well characterized semiconductor surfaces. Using molecular beam scattering methods, the interaction of hyperthermal ions and radicals with the Si(100) and (111) surfaces will be examined. Effects of rotational steering in interhalogen reactants, chemical selectivity in the reactions, atom abstraction processes, and reactions with adsorbed layers will be studied to provide insight into these reactions of fundamental importance to semiconductor processing. A program will be developed to include high school teachers in the basic research associated with this project, in order to foster increased understanding of current technology and its application. This program will impact high school teachers and their students through participation in cutting edge research during the summers, and follow up with classroom activities throughout the school year. The fundamental interactions of small reactive ions and radicals with semiconductor surfaces forms the research basis of this CAREER project. Involving local high school teachers in the basic research effort during summers, and outreach to their classrooms during the academic year, forms its educational basis. Molecular beam scattering methods coupled with spectroscopic characterization of silicon surfaces will allow the research group of Professor Sean Casey at the University of Nevada-Reno to examine the fundamentals of these surface reactions which are of significant importance to the area of semiconductor processing.

这个职业生涯项目，在分析和表面化学程序的支持，解决了详细的反应自由基与表征半导体表面的相互作用。 用分子束散射方法研究了超热离子和自由基与Si（100）和（111）表面的相互作用。 将研究卤素间反应物中的旋转转向，反应中的化学选择性，原子提取过程，以及与吸附层的反应的影响，以深入了解这些对半导体加工具有根本重要性的反应。 将制定一项计划，将高中教师纳入与该项目相关的基础研究，以促进对当前技术及其应用的更多了解。 该计划将影响高中教师和他们的学生通过在夏季参与前沿研究，并在整个学年的课堂活动跟进。小反应离子和自由基与半导体表面的基本相互作用构成了这个CAREER项目的研究基础。 让当地高中教师在夏季参与基础研究工作，并在学年期间向他们的教室推广，形成了其教育基础。 分子束散射方法与硅表面的光谱表征相结合，将使内华达大学里诺分校的Sean凯西教授的研究小组能够研究这些表面反应的基本原理，这些表面反应对半导体加工领域具有重要意义。