CAREER: Reactive Radical Interactions with Clean and Adsorbate Covered Semiconductor Surfaces

这个职业项目得到了分析和表面化学计划的支持，研究了反应性自由基与特征良好的半导体表面的详细相互作用。用分子束散射方法研究了超热离子和自由基与Si(100)和(111)表面的相互作用。将研究卤素间反应物的旋转转向效应、反应中的化学选择性、原子提取过程以及与吸附层的反应，以深入了解这些对半导体加工至关重要的反应。将制定一项计划，将高中教师纳入与该项目相关的基础研究，以促进对当前技术及其应用的更多了解。该计划将通过在暑期参与前沿研究来影响高中教师和他们的学生，并在整个学年跟踪课堂活动。小反应离子和自由基与半导体表面的基本相互作用构成了这一职业项目的研究基础。让当地高中教师在暑期参与基础研究工作，并在学年期间延伸到他们的教室，构成了它的教育基础。分子束散射方法与硅表面的光谱表征相结合，将使内华达大学雷诺分校的肖恩·凯西教授的研究小组能够研究这些表面反应的基本原理，这些反应对半导体加工领域非常重要。

This CAREER project, supported in the Analytical and Surface Chemistry Program, addresses the detailed interactions of reactive radicals with well characterized semiconductor surfaces. Using molecular beam scattering methods, the interaction of hyperthermal ions and radicals with the Si(100) and (111) surfaces will be examined. Effects of rotational steering in interhalogen reactants, chemical selectivity in the reactions, atom abstraction processes, and reactions with adsorbed layers will be studied to provide insight into these reactions of fundamental importance to semiconductor processing. A program will be developed to include high school teachers in the basic research associated with this project, in order to foster increased understanding of current technology and its application. This program will impact high school teachers and their students through participation in cutting edge research during the summers, and follow up with classroom activities throughout the school year. The fundamental interactions of small reactive ions and radicals with semiconductor surfaces forms the research basis of this CAREER project. Involving local high school teachers in the basic research effort during summers, and outreach to their classrooms during the academic year, forms its educational basis. Molecular beam scattering methods coupled with spectroscopic characterization of silicon surfaces will allow the research group of Professor Sean Casey at the University of Nevada-Reno to examine the fundamentals of these surface reactions which are of significant importance to the area of semiconductor processing.