STTR Phase II: Nanostructure Fabrication Using Near-Field Scanning Optical Microscopy

STTR 第二阶段：使用近场扫描光学显微镜制造纳米结构

• 批准号: 0110486
• 负责人: Russell Hollingsworth
• 金额: $ 50万
• 依托单位: ITN ENERGY SYSTEMS, INC.
• 依托单位国家: 美国
• 项目类别: Standard Grant
• 财政年份: 2001
• 资助国家: 美国
• 起止时间: 2001-09-01 至 2003-08-31
• 项目状态: 已结题
• 来源: https://www.nsf.gov/awardsearch/showAward?AWD_ID=0110486&HistoricalAwards=false
• 关键词: STTR; Phase; II; Nanostructure; Fabrication

This Small Business Technology Transfer (STTR) Phase II project will further develop a revolutionary approach to nanostructure fabrication. This Near-Field Scanning Optical Nanolithographic approach, which we have already shown to be capable of writing 100nm width lines, utilizes a direct, optical write technology in conjunction with optical photoresists. The direct optical writing is performed with a customized Near-Field Scanning Optical Microscope (NSOM) tool. The major goal of the proposed work is to design and construct a commercially viable NSOM lithography tool and demonstrate processes for flexible pattern generation on 4" wafers. Phase I work demonstrated the preliminary design of the NSOM lithography tool and photoresist processes using a novel inorganic hydrogenated amorphous silicon resist, as well as conventional polymer resists. Best line widths of approximately 100nm, comparable to the probe diameter, wereobtained.The commercial benefits from this project will be the construction and demonstration of the NSOM lithography tool for rapid prototyping of nanostructures in university and corporate research labs.

这个小型企业技术转移（STTR）二期项目将进一步发展一种革命性的纳米结构制造方法。这种近场扫描光学纳米光刻方法，我们已经证明能够写入100nm宽的线，利用直接的光学写入技术与光学光刻胶相结合。使用定制的近场扫描光学显微镜（NSOM）工具进行直接光学写入。这项工作的主要目标是设计和构建一个商业上可行的NSOM光刻工具，并演示在4英寸晶圆上柔性图案生成的过程。第一阶段的工作展示了NSOM光刻工具和光刻胶工艺的初步设计，使用了一种新型的无机氢化非晶硅光刻胶，以及传统的聚合物光刻胶。最佳线宽约为100nm，与探针直径相当。该项目的商业效益将是NSOM光刻工具的构建和演示，用于在大学和企业研究实验室中快速制作纳米结构的原型。