STTR Phase II: Nanostructure Fabrication Using Near-Field Scanning Optical Microscopy

STTR 第二阶段：使用近场扫描光学显微镜制造纳米结构

• 批准号: 0110486
• 负责人: Russell Hollingsworth
• 金额: $ 50万
• 依托单位: ITN ENERGY SYSTEMS, INC.
• 依托单位国家: 美国
• 项目类别: Standard Grant
• 财政年份: 2001
• 资助国家: 美国
• 起止时间: 2001-09-01 至 2003-08-31
• 项目状态: 已结题
• 来源: https://www.nsf.gov/awardsearch/showAward?AWD_ID=0110486&HistoricalAwards=false
• 关键词: STTR; Phase; II; Nanostructure; Fabrication

This Small Business Technology Transfer (STTR) Phase II project will further develop a revolutionary approach to nanostructure fabrication. This Near-Field Scanning Optical Nanolithographic approach, which we have already shown to be capable of writing 100nm width lines, utilizes a direct, optical write technology in conjunction with optical photoresists. The direct optical writing is performed with a customized Near-Field Scanning Optical Microscope (NSOM) tool. The major goal of the proposed work is to design and construct a commercially viable NSOM lithography tool and demonstrate processes for flexible pattern generation on 4" wafers. Phase I work demonstrated the preliminary design of the NSOM lithography tool and photoresist processes using a novel inorganic hydrogenated amorphous silicon resist, as well as conventional polymer resists. Best line widths of approximately 100nm, comparable to the probe diameter, wereobtained.The commercial benefits from this project will be the construction and demonstration of the NSOM lithography tool for rapid prototyping of nanostructures in university and corporate research labs.

这一小型企业技术转移(STTR)第二阶段项目将进一步开发一种革命性的纳米结构制造方法。这种近场扫描光学纳米光刻方法，我们已经证明能够写入100 nm宽线，将直接光学写入技术与光学光致抗蚀剂结合使用。使用定制的近场扫描光学显微镜(NSOM)工具执行直接光学写入。这项拟议工作的主要目标是设计和构建一种商业上可行的NSOM光刻工具，并演示在4英寸晶片上灵活生成图形的工艺。第一阶段工作演示了NSOM光刻工具的初步设计和使用新型无机氢化非晶硅抗蚀剂和传统聚合物抗蚀剂的光致抗蚀剂工艺。获得了与探针直径相当的约100 nm的最佳线宽。该项目的商业利益将是建造和演示NSOM光刻工具，用于大学和企业研究实验室的纳米结构快速原型制作。