STTR Phase I: Nanostructure Fabrication Using Near-Field Scanning Optical Microscopy

小企业技术转让（STTR）第一阶段项目旨在进一步开发纳米结构制造的革命性方法。 这种近场扫描光学纳米光刻方法已经被证明能够写入100 nm宽度的线，利用直接的光学写入技术结合光学光刻胶。 使用定制的近场扫描光学显微镜（NSOM）工具执行直接光学写入。 建议的工作的主要目标是设计和构建一个NSOM光刻工具，并演示了灵活的4英寸晶圆图形生成过程。 第一阶段的工作将涉及设计的NSOM光刻工具和光刻胶工艺演示使用提议者的新型无机氢化非晶硅抗蚀剂，以及传统的聚合物抗蚀剂。 将进行氢钝化硅氧化的基础研究。 第二阶段将看到的NSOM光刻工具的建设和示范。 分辨率低于100 nm的NSOM光刻工具将比电子束光刻系统便宜得多，使研究界的科学家和工程师能够更广泛地使用纳米光刻技术，从而加速纳米级IC技术的创新水平

This Small Business Technology Transfer (STTR) Phase I project aims to further develop a revolutionary approach to nanostructure fabrication. This Near-Field Scanning Optical Nanolithographic approach which has already been shown to be capable of writing 100nm width lines, utilizes a direct, optical write technology in conjunction with optical photoresists. The direct optical writing is performed with a customized Near-Field Scanning Optical Microscope (NSOM) tool. The major goal of the proposed work is to design and construct an NSOM lithography tool and demonstrate processes for flexible pattern generation on 4 inch wafers. Phase I work will involve design of the NSOM lithography tool and photoresist process demonstrations using the proposer's novel inorganic hydrogenated amorphous silicon resist, as well as conventional polymer resists. Fundamental studies of the oxidation of hydrogen passivated silicon will be performed. Phase II will see the construction and demonstration of the NSOM lithography tool. An NSOM lithography tool with sub-100nm resolution will be much cheaper than e-beam lithography systems, making nanolithography available to a much broader range of scientists and engineers within the research community, thereby accelerating the level of innovation in nanoscale IC technology