STTR Phase I: Nanostructure Fabrication Using Near-Field Scanning Optical Microscopy

这个小型企业技术转移（STTR）第一阶段项目旨在进一步开发一种革命性的纳米结构制造方法。这种近场扫描光学纳米光刻方法已经被证明能够写入100nm宽的线，利用直接的光学写入技术与光学光刻胶相结合。使用定制的近场扫描光学显微镜（NSOM）工具进行直接光学写入。这项工作的主要目标是设计和构建一个NSOM光刻工具，并演示在4英寸晶圆上柔性图案生成的过程。第一阶段的工作将涉及NSOM光刻工具的设计和光刻胶工艺演示，使用申请人的新型无机氢化非晶硅光刻胶，以及传统的聚合物光刻胶。将进行氢钝化硅氧化的基础研究。第二阶段将看到NSOM光刻工具的构建和演示。一个低于100纳米分辨率的NSOM光刻工具将比电子束光刻系统便宜得多，使纳米光刻技术在研究社区的科学家和工程师中得到更广泛的应用，从而加速纳米级集成电路技术的创新水平

This Small Business Technology Transfer (STTR) Phase I project aims to further develop a revolutionary approach to nanostructure fabrication. This Near-Field Scanning Optical Nanolithographic approach which has already been shown to be capable of writing 100nm width lines, utilizes a direct, optical write technology in conjunction with optical photoresists. The direct optical writing is performed with a customized Near-Field Scanning Optical Microscope (NSOM) tool. The major goal of the proposed work is to design and construct an NSOM lithography tool and demonstrate processes for flexible pattern generation on 4 inch wafers. Phase I work will involve design of the NSOM lithography tool and photoresist process demonstrations using the proposer's novel inorganic hydrogenated amorphous silicon resist, as well as conventional polymer resists. Fundamental studies of the oxidation of hydrogen passivated silicon will be performed. Phase II will see the construction and demonstration of the NSOM lithography tool. An NSOM lithography tool with sub-100nm resolution will be much cheaper than e-beam lithography systems, making nanolithography available to a much broader range of scientists and engineers within the research community, thereby accelerating the level of innovation in nanoscale IC technology