Nanometer Resolution of Reactive Sites on Heterogeneous Metal Surfaces

异质金属表面反应位点的纳米分辨率

• 批准号: 0132550
• 负责人: William Smyrl
• 金额: $ 29.5万
• 依托单位: University of Minnesota-Twin Cities
• 依托单位国家: 美国
• 项目类别: Standard Grant
• 财政年份: 2002
• 资助国家: 美国
• 起止时间: 2002-03-01 至 2005-08-31
• 项目状态: 已结题
• 来源: https://www.nsf.gov/awardsearch/showAward?AWD_ID=0132550&HistoricalAwards=false
• 关键词: Nanometer; Resolution; Reactive; Sites; Heterogeneous

This grant explores high-resolution topographic imaging with concurrent optical, electrochemical, photoelectrochemical, and fluorescence mapping. These techniques are based on novel modifications of a commercial Near Field Optical Scanning Microscopic (NSOM Topometrix) to obtain shear force feedback control with a piezoelectric tuning fork. Optical resolutions of 60 nm and electrochemical resolutions of 50 nm have been achieved for these functional microscopies. This research is aimed at extending these resolutions to 10 nm or below. In addition a study of pitting precursor sites will be made for high purity titanium, titanium alloys, and aluminum alloys. This should facilitate in-situ and ex-situ evaluation of surface treatments used to mitigate pitting corrosion.A primary goal of this work is to develop these high-resolution capabilities to identify precursor sites for corrosion of microelectronic and magnetic storage assemblies. As the dimensions of these and similar devices decrease, corrosion becomes increasingly important and techniques to explore heterogeneous surfaces are needed. Magnetic storage surfaces can be covered with diamond-like carbon coatings to provide tribological protection, and it is important to determine how well these surfaces protect against corrosion as well. Scanning electrochemical microscopy with concurrent topographic mapping is the primary technique used for the studies. A secondary goal is to employ these successful characterization techniques for fabrication of novel surface structures.

这项资助旨在探索高分辨率地形成像与并发光学，电化学，光电化学和荧光映射。这些技术是基于新的修改的商业近场光学扫描显微镜（NSOM拓扑），以获得剪切力反馈控制与压电音叉。这些功能显微镜的光学分辨率为60 nm，电化学分辨率为50 nm。这项研究旨在将这些分辨率扩展到10 nm或更低。此外，还将对高纯钛、钛合金和铝合金的点蚀前体部位进行研究。这将有助于现场和非现场评估用于减轻点蚀的表面处理。这项工作的主要目标是开发这些高分辨率的能力，以确定微电子和磁存储组件的腐蚀前体部位。随着这些和类似器械尺寸的减小，腐蚀变得越来越重要，需要探索异质表面的技术。磁存储表面可以覆盖类金刚石碳涂层以提供摩擦学保护，并且确定这些表面的抗腐蚀能力也很重要。扫描电化学显微镜与同步地形图是用于研究的主要技术。第二个目标是采用这些成功的表征技术制造新的表面结构。