US-Turkey Cooperative Research: Processing for Sub-Micron Imaging in Supercritical CO2: An Integrated Approach to the Deposition and Development of Photoresists

0138283 DeSimone描述：本项目支持北卡罗来纳州查佩尔山北卡罗来纳州（北卡罗来纳州）化学系Joseph DeSimone博士和土耳其伊斯坦布尔萨班奇大学（SU）工程和自然科学系Yusuf Menceloglu博士之间的合作研究。 他们计划研究改进半导体器件制造的方法。 将半导体器件推进到亚微米特征的瓶颈是新型抗蚀剂材料的开发，该新型抗蚀剂材料在期望的曝光下显示出几乎前所未有的灵敏度，并且经历了从酚醛树脂的根本转变，该酚醛树脂已经被用作几乎所有光学抗蚀剂开发的基础，同时改善了与该过程相关的环境条件。PI和他的同事们将合成一系列氟化聚合物，这些聚合物将使用超临界CO2工艺制造光刻胶。 这两个小组计划开发用于157 nm光刻的新光刻胶。 新的抗蚀剂将是透明的，并且将在液体和/或超临界CO2下可溶。 它们的性质将通过理论计算进行评估，然后在SU实验室进行合成。这项研究可能会导致未来微电子工艺的重大变化，并可能对光刻胶生产产生重大影响，使其成为一种环境友好的工艺。范围：两个小组在北京大学和SU有互补的能力和技术资源。 在拟议的三年合作期间，将结合各种活动来促进两个小组之间的沟通，包括每年一个月对SU实验室的访问、电子邮件和电话会议。这两个小组过去合作开发了八项关于二氧化碳中多相聚合的美国专利，并在重要期刊上发表了几篇关于聚合和聚合物材料表征的论文。 一名研究生将参加该项目，为他提供国际经验。 资金由国际科学和工程办公室以及化学和运输系统司提供。

0138283 DeSimoneDescription: This project supports a cooperative research between Dr. Joseph DeSimone, Department of Chemistry, University of North Carolina (UNC) at Chapel Hill, North Carolina and Dr. Yusuf Menceloglu, Department of Engineering and Natural Sciences, Sabanci University (SU), Istanbul, Turkey. They plan to research means to improve the manufacturing of semiconductor devices. A bottleneck in advancing semiconductor devices to sub-micron features is the development of novel resist materials that show nearly unprecedented sensitivity at the desired exposures and undergo a fundamental shift away from the phenolic resins that have been used as the basis for virtually all optical resist development, while improving the environmental conditions associated with the process. The PI and his colleagues will synthesize an array of fluorinated polymers that will enable photoresist fabrication using a supercritical CO2 process. The two groups plan to develop new photoresists for 157 nm lithography. The new resists will be transparent, and will be soluble at liquid and/or supercritical CO2. Their properties will be evaluated by theoretical calculations, and then their synthesis will be conducted at SU laboratories. The research may lead to significant change in future microelectronic processes and could have a major impact on rendering photoresist production an environmentally friendly process.Scope: The two groups at UNC and SU have complementary capabilities and technical resources. A combination of activities will be used to facilitate communication between the two groups over the proposed three-year collaboration including one-month per year visits to SU laboratories, electronic mail, and teleconferencing. The two groups have collaborated in the past to develop eight US patents on heterogeneous polymerizations in CO2 and to produce several publications in important journals on polymerizations and on characterizations of polymer materials. A graduate student at UNC will participate in the project providing him with an international experience. Funding is provided by the Office of International Science and Engineering and the Division of Chemical and Transport Systems.