NIRT: Motion control platform for accurate measurement and manufacturing of nanostructures

该提案是响应纳米尺度科学与工程计划，NSF 01-157，类别NIRT而收到的。纳米尺度的定位和控制技术对于纳米技术研究仪器和用于制造和测试纳米设备的工具都是必不可少的，但是很少有，如果有的话，可靠的和可重复的解决方案存在。为了实现宏观有用系统的制造，需要具有几何精度和精度的机制，以促进从纳米科学到生产纳米技术的过渡。这对于复杂形状机构的多工序制造和装配尤为重要。该项目的目标是生产一种便携式和精确的仪器，用于样品/探针运动，能够在长时间内在纳米水平上运行。这项工作的结果将是一个紧凑和高度集成的仪器，能够在50毫米x 50毫米的完整扫描区域内重复定位宏观尺寸的物体，如硅片，并返回到指定位置，从而能够观察包含纳米尺寸物体的过程，以及“挑选和放置”多组件组装的能力。该仪器将使纳米分辨率工具能够聚焦于放置在仪器操作范围内任何地方的纳米器件，用于压印光刻、光刻自组装、纳米线电路以及复杂的多工艺和多尺度组装。这一发展将为在当前技术能力极限下的基本测量是一个问题的所有领域的纳米技术研究提供一个设施，特别是在生物力学、纳米电子学和纳米力学领域。在新兴的纳米技术应用仪器和机器设计领域，未来工程师的培训将在仪器系统的开发过程中进行，并通过后续项目和基于开发设施的研究生指导进行。我们也设想，纳米机构设计的结构知识将被纳入研究生精密机械设计课程。一门名为“纳米技术的机械系统”的新研究生课程目前正在开发中，将于2002年秋季学期开设。此外，将开发一个项目网站，其中将包括本项目具体的后勤和技术讨论页的链接以及相关网站的链接。作为我们向k-12社区拓展的一部分，将有一个部分提供针对高中读者的这项工作的概述。

This proposal was received in response to Nanoscale Science and Engineering initiative, NSF 01-157, category NIRT. Nano-scale positioning and control technology will be essential both for nanotechnology research instrumentation and for tools dedicated to fabrication and testing of nano-devices, but few, if any, robust and reproducible solutions exist. To realize manufacture of macroscopically useful systems, it is necessary to have mechanisms with geometric precision and accuracy to facilitate the transition from nano-science to productive nanotechnology. This will be particularly important for multi-process manufacture and assembly of complexly shaped mechanisms. The objective of this project is to produce a portable and accurate instrument for sample/probe motion that is capable of performing at nanometer levels over protracted time periods. The output of this work will be a compact and highly integrated instrument, capable of reproducibly positioning a macro-sized object such as a silicon wafer over the complete scan area of 50 mm x 50 mm and return to a specified position thereby enabling observations of processes containing nanometer-sized objects as well as the ability to 'pick and place' for multi-component assembly. The instrument would enable nanometer resolution tools to focus on a nano-device placed anywhere over the instruments operating range for applications such as imprint lithography, lithographic self assembly, nanowire circuitry and complex multi-process and multi-scale assemblies. This development will provide a facility for nanotechnology studies in all fields for which fundamental measurements at the limits of current technological capability are an issue, in particular, in the fields of bio-mechanics, nano-electronics and nano-mechanics. Training of future engineers in the emerging field of instrument and machine design for nanotechnology applications will take place both during the development of the instrumentation systems and through subsequent projects and graduate instruction based around the developed facility. It is also envisaged that knowledge of architectures for nanometer mechanism design will be incorporated into graduate precision machine design courses. A new graduate course titled 'Mechanical systems for nanotechnology' is currently being developed and will be offered in the 2002 fall semester. Additionally, a project web-site will be developed that will include links to logistical and technical discussion pages specific to this project as well as links to related sites. As part of our outreach to the k-12 community there will be a section providing an overview of this work aimed towards high school level readership.