Reactions of Transition Metal Complexes with Silanes and Oxygen. Chemistry in Molecular Approaches to Silicon-Based Microelectronic Materials

过渡金属络合物与硅烷和氧的反应。

• 批准号: 0212137
• 负责人: Ziling Xue
• 金额: $ 37.5万
• 依托单位: University of Tennessee Knoxville
• 依托单位国家: 美国
• 项目类别: Continuing Grant
• 财政年份: 2002
• 资助国家: 美国
• 起止时间: 2002-08-01 至 2005-07-31
• 项目状态: 已结题
• 来源: https://www.nsf.gov/awardsearch/showAward?AWD_ID=0212137&HistoricalAwards=false
• 关键词: Reactions; Transition; Metal; Complexes; Silanes

Dr. Ziling B. Xue, Chemistry Department, University of Tennessee, is supported by the Inorganic, Bioinorganic, and Organometallic Chemistry Program of the Chemistry Division for studies of early transition metal-silane chemistry. The reactions of silanes with d0 imides and dn amides will be compared with those of d0 amides to determine how the pi character of the metal-imide bond and the d electron count in the metal-amides influence sigma bond metathesis. To explore the generality of the results obtained with the imides and amides, the study will be extended to reactions between silanes and early transition metal alkoxides. Reactions of the alkoxides with silanes and of metal silyl complexes with oxygen will be developed as new routes to metal-silicon-oxygen phases. In collaboration with scientists at Oak Ridge National Laboratory, the compounds prepared in this investigation will be used as precursors to prepare silicon based microelectronic materials by chemical vapor deposition. During all stages of the project theoretical calculations will be carried out in order to understand the emerging chemistry.The objective of the research is to develop the new precursors and routes to silicon-based microelectronic materials. The first portion of this study will develop fundamental chemistry that is relevant to the preparation of silicon based microelectronic materials. Then chemical processes to yield these advanced microelectronic materials will be developed. These materials include those used as diffusion barriers and high dielectric constant gate materials in very-large-scale-integration (VLSI) devices.

紫玲B医生。薛，化学系，田纳西大学，是由无机，生物无机和有机化学计划的化学部的早期过渡金属硅烷化学研究的支持。 硅烷与d 0酰亚胺和dn酰胺的反应将与d 0酰胺的反应进行比较，以确定金属-酰亚胺键的π特征和金属-酰胺中的d电子数如何影响σ键复分解。为了探索与酰亚胺和酰胺得到的结果的一般性，研究将扩展到硅烷和早期过渡金属醇盐之间的反应。 烷氧基化合物与硅烷的反应以及金属甲硅烷基络合物与氧的反应将被开发为金属-硅-氧相的新途径。与橡树岭国家实验室的科学家合作，在这项调查中制备的化合物将被用作前体，通过化学气相沉积制备硅基微电子材料。在项目的各个阶段，将进行理论计算，以了解新兴的化学。研究的目标是开发新的前体和硅基微电子材料的路线。本研究的第一部分将发展与硅基微电子材料制备相关的基础化学。然后将开发生产这些先进微电子材料的化学工艺。这些材料包括那些在超大规模集成电路（VLSI）器件中用作扩散阻挡层和高介电常数栅极材料的材料。